M. D. Mikhnenko, S. V. Cherepanova, A. N. Shmakov, M. V. Alekseeva, R. G. Kukushkin, V. A. Yakovlev, V. P. Pakharukova, O. A. Bulavchenko
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引用次数: 0
Abstract
In this work, NiO and NiO–SiO2 are studied using X-ray diffraction and the method of atomic-pair radial distribution. Using X-ray phase analysis, it is determined that the sizes of NiO particles have a coherent-scattering region of more than 100 nm, while the NiO–SiO2 sample has particle sizes of about 2–3 nm. However, full-profile simulation using the Rietveld method does not allow one to describe the effects observed during diffraction: asymmetry of the peaks, the appearance of an additional shoulder of peak 111 in the region of small angles; therefore, the method of atomic-pair radial distribution is used to analyze the structure. When simulating the experimental curve of the atomic-pair radial distribution, 3 different models are used: pure NiO, a mixture of NiO and Ni2SiO4, as well as a modified NiO model with Si embedded into the crystal lattice. The latter model is created based on the assumption of the incorporation of silicon into the NiO structure, as can be evidenced by the X-ray diffraction data. According to the results of simulation of the curve of the atomic-pair radial distribution, it is the latter model that provides the best description of the observed effects: a significantly increased unit-cell parameter in comparison with the sample without the addition of SiO2, as well as decreased cation–oxygen distances in the structure while the distances between cations are increased.
期刊介绍:
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.