Effect of the Implantation of ${\text{O}}_{{\text{2}}}^{ + }$ Ions on the Composition and Electronic Structure of CdS Films

IF 0.5 Q4 PHYSICS, CONDENSED MATTER

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques Pub Date : 2024-07-15 DOI:10.1134/S1027451024700150

B. E. Umirzakov, J. Sh. Sodikjanov, Z. A. Isakhanov, A. A. Abduvayitov

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Abstract

A method of low-energy ion implantation is used for the first time to create oxide layers on the surface of a CdS material. After annealing at a temperature of 800 K of CdS implanted with ${\text{O}}_{2}^{ + }$ ions with an energy of E₀ = 1 keV at a dose of D_sat ≈ 8 × 10¹⁶ cm^–2, a three-component film of CdO_0.7S_0.3 is formed, and after annealing at 900 K a CdO film is formed. Using Auger-electron spectroscopy, photoelectron spectroscopy, and light-absorption spectroscopy, the composition, parameters of the energy bands, optical parameters, and densities of state of valence electrons of CdO_0.7S_0.3 and CdO nanofilms are determined. The results of the study allow one to consider the possibility of using CdO_0.7S_0.3 films as transparent films and contact layers in various devices including solar cells.

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植入 $${\{O}}_{{\text{2}}}^{ + }$ 离子对 CdS 薄膜成分和电子结构的影响

摘要首次采用低能离子注入法在 CdS 材料表面形成氧化层。用能量为 E0 = 1 keV、剂量为 Dsat ≈ 8 × 1016 cm-2 的 ${\text{O}}_{2}^{ + }$ 离子植入 CdS，在 800 K 温度下退火后，形成了 CdO0.7S0.3 的三组分薄膜，在 900 K 退火后又形成了 CdO 薄膜。利用欧杰电子能谱、光电子能谱和光吸收光谱测定了 CdO0.7S0.3 和 CdO 纳米薄膜的成分、能带参数、光学参数和价电子态密度。根据研究结果，我们可以考虑将 CdO0.7S0.3 薄膜用作各种设备（包括太阳能电池）中的透明薄膜和接触层。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques PHYSICS, CONDENSED MATTER-

CiteScore

0.90

自引率

25.00%

发文量

144

审稿时长

3-8 weeks

期刊介绍： Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.

Effect of the Implantation of \({\text{O}}_{{\text{2}}}^{ + }\) Ions on the Composition and Electronic Structure of CdS Films

Abstract