Liquid Metal Grid Patterned Thin Film Devices Toward Absorption-Dominant and Strain-Tunable Electromagnetic Interference Shielding

IF 26.6 1区材料科学 Q1 Engineering

Nano-Micro Letters Pub Date : 2024-07-17 DOI:10.1007/s40820-024-01457-7

Yuwen Wei, Priyanuj Bhuyan, Suk Jin Kwon, Sihyun Kim, Yejin Bae, Mukesh Singh, Duy Thanh Tran, Minjeong Ha, Kwang-Un Jeong, Xing Ma, Byeongjin Park, Sungjune Park

引用次数: 0

Abstract

Multiple internal reflection-based absorption-dominant stretchable electromagnetic shielding thin film by incorporating liquid metal grid structure is developed.
The device demonstrates high electromagnetic shielding effectiveness (SE) (SE_T of up to 75 dB) with low reflectance (SE_R of 1.5 dB at the resonant frequency).
The shielding properties of the device can be tuned by adjusting the liquid metal patterned grid spaces upon strain.

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液态金属栅格图案化薄膜设备，实现以吸收为主、应变可调的电磁干扰屏蔽。

下一代可穿戴和微型软电子设备对高性能薄膜形可变形电磁干扰（EMI）屏蔽器件的需求日益增长。虽然高反射导电材料能有效屏蔽电磁干扰，但由于其刚性会阻止器件变形，同时还会产生二次电磁污染。本文介绍了具有以吸收为主的 EMI 屏蔽行为的软质可拉伸 EMI 屏蔽薄膜器件。该器件由液态金属（LM）层和 LM 网格图案层组成，中间由一层薄弹性体薄膜隔开，利用气溶胶沉积的 LM 在弹性体上的优异附着力制造而成。由于 LM 网格结构中产生的多重内部反射诱发了电磁干扰吸收，因此这些器件具有高电磁屏蔽效能（SE）（SET 高达 75 dB）和低反射率（谐振频率下的 SER 为 1.5 dB）。值得注意的是，基于 LM 的器件具有出色的可拉伸性，可通过应变时的栅格空间调整实现可调的 EMI 屏蔽能力（应变 33% 时谐振频率从 81.3 GHz 变为 71.3 GHz），即使在多次应变周期后也能保持屏蔽效果。这种新开发的器件为下一代智能电子产品提供了一种先进的范例，可实现强大的 EMI 屏蔽性能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Nano-Micro Letters NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

32.60

自引率

4.90%

发文量

981

审稿时长

1.1 months

期刊介绍： Nano-Micro Letters is a peer-reviewed, international, interdisciplinary, and open-access journal published under the SpringerOpen brand. Nano-Micro Letters focuses on the science, experiments, engineering, technologies, and applications of nano- or microscale structures and systems in various fields such as physics, chemistry, biology, material science, and pharmacy.It also explores the expanding interfaces between these fields. Nano-Micro Letters particularly emphasizes the bottom-up approach in the length scale from nano to micro. This approach is crucial for achieving industrial applications in nanotechnology, as it involves the assembly, modification, and control of nanostructures on a microscale.