Tunable Ion Conductivity in Defect-Controlled Graphene Nanochannels

IF 6.4 3区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Yang-Jun Cui, Long Gao, Cuifeng Ying, Jian-Guo Tian, Zhi-Bo Liu
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Abstract

Many novel transport phenomena are observed in graphene nanochannels with ultrahigh surface flatness and nano- or sub-nanoscale constraints. Two critical physical parameters, surface slip length, and surface charge, play a vital role in the channel transport process. However, effectively controlling these parameters under such tight constraints remains a significant challenge. Here, it is developed a novel method that combines oxygen ion etching and layer-by-layer assembly of 2D material, to prepare graphene nanochannels. During the assembly process, defects are introduced into the graphene surface via oxygen ion etching. A significantly higher conductivity is observed for the pristine graphene channels compared to those with defects on both the upper and lower surfaces. Consistent with this observation, the conductivity of graphene channels with defects on only one surface falls between the two aforementioned values. Combined with theoretical analysis, the conductivity difference is attributed to the surface slip inhibition due to the introduced defects, and the change of surface charge, both caused by oxygen ion etching. By introducing defects, a new method is uncovered for fine-tuning ion transport in graphene nanochannels.

Abstract Image

缺陷控制石墨烯纳米通道中的可调离子传导性
在具有超高表面平整度和纳米或亚纳米级限制的石墨烯纳米通道中观察到了许多新颖的传输现象。表面滑移长度和表面电荷这两个关键物理参数在通道传输过程中起着至关重要的作用。然而,在如此严格的限制条件下有效控制这些参数仍然是一项重大挑战。在此,我们开发了一种结合氧离子蚀刻和逐层组装二维材料的新方法,用于制备石墨烯纳米通道。在组装过程中,通过氧离子刻蚀将缺陷引入石墨烯表面。与上下表面都有缺陷的石墨烯相比,原始石墨烯通道的导电率明显更高。与这一观察结果一致,仅在一个表面存在缺陷的石墨烯通道的电导率介于上述两个数值之间。结合理论分析,电导率差异可归因于引入缺陷导致的表面滑移抑制以及氧离子刻蚀引起的表面电荷变化。通过引入缺陷,揭示了一种微调石墨烯纳米通道中离子传输的新方法。
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来源期刊
Advanced Materials Technologies
Advanced Materials Technologies Materials Science-General Materials Science
CiteScore
10.20
自引率
4.40%
发文量
566
期刊介绍: Advanced Materials Technologies Advanced Materials Technologies is the new home for all technology-related materials applications research, with particular focus on advanced device design, fabrication and integration, as well as new technologies based on novel materials. It bridges the gap between fundamental laboratory research and industry.
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