{"title":"Exploring the effect of facile i-line photolithography on the structure and physicochemical properties of photosensitive glass ceramics","authors":"","doi":"10.1016/j.ceramint.2024.07.082","DOIUrl":null,"url":null,"abstract":"<div><div>Photosensitive glass-ceramics exhibit significant potential to replace silicon materials in the microfabrication of micro-electro-mechanical-system (MEMS) devices. However, they are constrained by the limitations of a conventional 320-nm photolithography process. Therefore, developing an ideal industrial i-line (365 nm) photolithography for Li<sub>2</sub>O–Al<sub>2</sub>O<sub>3</sub>–SiO<sub>2</sub> photosensitive glass-ceramics is urgently needed. This study initially explores the impact of a facile i-line photolithography on the structure and physicochemical properties of photosensitive glass ceramics. We experimentally showcase a direct, scalable, and straightforward i-line photolithography technique for Li<sub>2</sub>O–Al<sub>2</sub>O<sub>3</sub>–SiO<sub>2</sub> photosensitive glass ceramics. Our research concentrates on how the exposure time affects the properties of Li<sub>2</sub>O–Al<sub>2</sub>O<sub>3</sub>–SiO<sub>2</sub> photosensitive glass ceramics, particularly regarding nucleation and crystallization. This is achieved by adjusting the exposure time parameter and utilizing XRD, etching experiments, SEM, TEM, and other tests under a i-line light source. By optimizing the exposure process parameters, we also modify the annealing process parameters affecting the crystallization of lithium metasilicate in the exposed areas. Under a treatment process involving an exposure time of 20 min, a nucleation temperature of 500 °C, a crystallization temperature of 630 °C, and a nucleation/crystallization duration of 2 h, the sample achieves the highest crystal quantity and the optimal thickness-etching rate ratio.</div></div>","PeriodicalId":267,"journal":{"name":"Ceramics International","volume":null,"pages":null},"PeriodicalIF":5.1000,"publicationDate":"2024-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ceramics International","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0272884224029626","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, CERAMICS","Score":null,"Total":0}
引用次数: 0
Abstract
Photosensitive glass-ceramics exhibit significant potential to replace silicon materials in the microfabrication of micro-electro-mechanical-system (MEMS) devices. However, they are constrained by the limitations of a conventional 320-nm photolithography process. Therefore, developing an ideal industrial i-line (365 nm) photolithography for Li2O–Al2O3–SiO2 photosensitive glass-ceramics is urgently needed. This study initially explores the impact of a facile i-line photolithography on the structure and physicochemical properties of photosensitive glass ceramics. We experimentally showcase a direct, scalable, and straightforward i-line photolithography technique for Li2O–Al2O3–SiO2 photosensitive glass ceramics. Our research concentrates on how the exposure time affects the properties of Li2O–Al2O3–SiO2 photosensitive glass ceramics, particularly regarding nucleation and crystallization. This is achieved by adjusting the exposure time parameter and utilizing XRD, etching experiments, SEM, TEM, and other tests under a i-line light source. By optimizing the exposure process parameters, we also modify the annealing process parameters affecting the crystallization of lithium metasilicate in the exposed areas. Under a treatment process involving an exposure time of 20 min, a nucleation temperature of 500 °C, a crystallization temperature of 630 °C, and a nucleation/crystallization duration of 2 h, the sample achieves the highest crystal quantity and the optimal thickness-etching rate ratio.
期刊介绍:
Ceramics International covers the science of advanced ceramic materials. The journal encourages contributions that demonstrate how an understanding of the basic chemical and physical phenomena may direct materials design and stimulate ideas for new or improved processing techniques, in order to obtain materials with desired structural features and properties.
Ceramics International covers oxide and non-oxide ceramics, functional glasses, glass ceramics, amorphous inorganic non-metallic materials (and their combinations with metal and organic materials), in the form of particulates, dense or porous bodies, thin/thick films and laminated, graded and composite structures. Process related topics such as ceramic-ceramic joints or joining ceramics with dissimilar materials, as well as surface finishing and conditioning are also covered. Besides traditional processing techniques, manufacturing routes of interest include innovative procedures benefiting from externally applied stresses, electromagnetic fields and energetic beams, as well as top-down and self-assembly nanotechnology approaches. In addition, the journal welcomes submissions on bio-inspired and bio-enabled materials designs, experimentally validated multi scale modelling and simulation for materials design, and the use of the most advanced chemical and physical characterization techniques of structure, properties and behaviour.
Technologically relevant low-dimensional systems are a particular focus of Ceramics International. These include 0, 1 and 2-D nanomaterials (also covering CNTs, graphene and related materials, and diamond-like carbons), their nanocomposites, as well as nano-hybrids and hierarchical multifunctional nanostructures that might integrate molecular, biological and electronic components.