Vapor-Phase Deposited Polymer Dielectric Layers for Organic Electronics: Design, Characteristics, and Applications

IF 2.9 4区 工程技术 Q2 CHEMISTRY, MULTIDISCIPLINARY
Sukwon Jang, Youson Kim, Chungryeol Lee, Taehyun Nam, Jeongik Park, Junyeong Yang, Juchan Kim, Bohyun Lee, Sung Gap Im
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Abstract

The emergence of organic electronics has transformed the landscape of electronic devices, paving the way for future advancements in low-power, flexible, and wearable electronics compatible with various form factors. Polymeric dielectric layers are pivotal in the implementation of organic electronics due to their inherent deformable characteristics as well as outstanding insulating performance. Here, the review highlights an innovative technology termed initiated chemical vapor deposition (iCVD) for synthesizing polymer dielectric materials, particularly in the context of organic thin-film transistors (OTFTs). The all-dry polymer deposition process circumvents issues associated with conventional solvent-based methods, such as residual solvent, potential damage to the substrate, and the lack of large-area uniformity, allowing for ultra-thin, high-purity polymer dielectric layers with exceptional dielectric performance comparable to inorganic dielectrics. Furthermore, iCVD process enables the incorporation of various chemical functionalities into the dielectric layer, which enables the generation of versatile, high-performance organic electronic devices. Based on the beneficial aspects of the iCVD process, the review provides an overview of iCVD polymer dielectric layers, emphasizing their significance and potential toward innovative applications in the fields of organic electronic, including OTFTs, resistive random-access memory (RRAM), flash memory and logic circuits.

Abstract Image

用于有机电子的气相沉积聚合物介电层:设计、特性和应用
有机电子产品的出现改变了电子设备的面貌,为未来兼容各种外形尺寸的低功耗、柔性和可穿戴电子产品的发展铺平了道路。聚合物介电层因其固有的可变形特性和出色的绝缘性能,在有机电子器件的应用中起着举足轻重的作用。本文重点介绍一种用于合成聚合物电介质材料的创新技术--化学气相沉积(iCVD),尤其是在有机薄膜晶体管(OTFT)方面。全干式聚合物沉积工艺规避了与传统溶剂型方法相关的问题,如溶剂残留、对基底的潜在损害以及缺乏大面积均匀性等,从而实现了超薄、高纯度聚合物介电层,其优异的介电性能可媲美无机介电材料。此外,iCVD 工艺还能在介电层中加入各种化学功能,从而产生多功能、高性能的有机电子器件。基于 iCVD 工艺的优点,综述概述了 iCVD 聚合物介电层,强调了其在有机电子领域创新应用的意义和潜力,包括 OTFT、电阻式随机存取存储器 (RRAM)、闪存和逻辑电路。
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来源期刊
Korean Journal of Chemical Engineering
Korean Journal of Chemical Engineering 工程技术-工程:化工
CiteScore
4.60
自引率
11.10%
发文量
310
审稿时长
4.7 months
期刊介绍: The Korean Journal of Chemical Engineering provides a global forum for the dissemination of research in chemical engineering. The Journal publishes significant research results obtained in the Asia-Pacific region, and simultaneously introduces recent technical progress made in other areas of the world to this region. Submitted research papers must be of potential industrial significance and specifically concerned with chemical engineering. The editors will give preference to papers having a clearly stated practical scope and applicability in the areas of chemical engineering, and to those where new theoretical concepts are supported by new experimental details. The Journal also regularly publishes featured reviews on emerging and industrially important subjects of chemical engineering as well as selected papers presented at international conferences on the subjects.
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