Mapping of valley splitting by conveyor-mode spin-coherent electron shuttling

IF 6.6 1区 物理与天体物理 Q1 PHYSICS, APPLIED
Mats Volmer, Tom Struck, Arnau Sala, Bingjie Chen, Max Oberländer, Tobias Offermann, Ran Xue, Lino Visser, Jhih-Sian Tu, Stefan Trellenkamp, Łukasz Cywiński, Hendrik Bluhm, Lars R. Schreiber
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Abstract

In Si/SiGe heterostructures, the low-lying excited valley state seriously limits the operability and scalability of electron spin qubits. For characterizing and understanding the local variations in valley splitting, fast probing methods with high spatial and energy resolution are lacking. Leveraging the spatial control granted by conveyor-mode spin-coherent electron shuttling, we introduce a method for two-dimensional mapping of the local valley splitting by detecting magnetic field-dependent anticrossings of ground and excited valley states using entangled electron spin-pairs as a probe. The method has sub-μeV energy accuracy and a nanometer lateral resolution. The histogram of valley splittings spanning a large area of 210 nm by 18 nm matches well with statistics obtained by the established but time-consuming magnetospectroscopy method. For the specific heterostructure, we find a nearly Gaussian distribution of valley splittings and a correlation length similar to the quantum dot size. Our mapping method may become a valuable tool for engineering Si/SiGe heterostructures for scalable quantum computing.

Abstract Image

通过传送带模式自旋相干电子穿梭绘制山谷分裂图
在硅/硅锗异质结构中,低洼激发谷态严重限制了电子自旋量子比特的可操作性和可扩展性。为了描述和了解谷分裂的局部变化,目前还缺乏具有高空间和能量分辨率的快速探测方法。利用传送带模式自旋相干电子穿梭所赋予的空间控制能力,我们引入了一种二维绘制局部谷分裂图的方法,即使用纠缠电子自旋对作为探针,通过探测磁场依赖的基态和激发态的反交叉来绘制谷分裂图。该方法具有亚微伏能量精度和纳米级横向分辨率。跨越 210 纳米 x 18 纳米大面积的谷分裂直方图与通过成熟但耗时的磁谱法获得的统计数据非常吻合。对于特定的异质结构,我们发现谷分裂近似高斯分布,相关长度与量子点尺寸相似。我们的制图方法可能会成为用于可扩展量子计算的硅/硅锗异质结构工程设计的重要工具。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
npj Quantum Information
npj Quantum Information Computer Science-Computer Science (miscellaneous)
CiteScore
13.70
自引率
3.90%
发文量
130
审稿时长
29 weeks
期刊介绍: The scope of npj Quantum Information spans across all relevant disciplines, fields, approaches and levels and so considers outstanding work ranging from fundamental research to applications and technologies.
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