Modelling Studies of Rotary Magnetic Field in ECDM for Microchannel Fabrication of Silica Glass

IF 2.8 3区材料科学 Q3 CHEMISTRY, PHYSICAL

Silicon Pub Date : 2024-06-13 DOI:10.1007/s12633-024-03057-x

Dilip Gehlot, Pradeep Kumar Jha, Pramod Kumar Jain

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引用次数: 0

Abstract

Recent developments in the fabrication of microfluidic channels of silica glass require repeatability and surface integrity for the industrial purpose of the ECDM process, which is made possible by controlling the dynamic parameters during machining. The characteristics of gas film, i.e., nucleation growth and bubble departure away from the tool, play a vigorous role in enhancing the quality characteristics of ECDM. MHD convection induced by a rotary magnetic field precisely regulates the gas film characteristics. It improves the ejection of particles at higher depths after chemical etching, which enhances the machining capability to fabricate a high aspect ratio microchannel. Various researchers have already done work by applying static magnetic fields in the ECDM process for micro-drilling. This work uses the novel approach of the rotary magnetic field in the electrochemical discharge machining process to fabricate microchannels using an in-house fabricated RMAECDM (Rotary magnetic field assisted ECDM) setup. The percentage reduction in the width overcut obtained by a rotary magnetic field compared to conventional ECDM and static magnetic field application is 21% and 8 %, respectively, under the same environments. Nature-inspired algorithms, coupled with Taguchi techniques, were applied to find the optimal setting of input parameters. The optimal voltage setting, concentration, field rotation, and magnetic strength are 40V,20%, 20000 RPM, and 220mT.

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用于硅玻璃微通道制造的 ECDM 中旋转磁场的建模研究

最近在硅玻璃微流控通道制造方面取得的进展要求电火花成形加工过程具有可重复性和表面完整性，以达到工业目的，而这可以通过控制加工过程中的动态参数来实现。气膜的特性，即成核生长和气泡离开工具，对提高 ECDM 的质量特性起着重要作用。旋转磁场诱导的 MHD 对流可精确调节气膜特性。它改善了化学蚀刻后颗粒在更高深度的喷射，从而提高了制造高纵横比微通道的加工能力。已有许多研究人员在 ECDM 工艺中应用静态磁场进行微钻孔加工。本研究在电化学放电加工过程中采用了旋转磁场这一新颖方法，利用自制的 RMAECDM（旋转磁场辅助电化学放电加工）装置制造微通道。在相同环境下，旋转磁场与传统 ECDM 和静态磁场相比，过切宽度分别减少了 21% 和 8%。自然启发算法与田口技术相结合，找到了输入参数的最佳设置。最佳电压设置、浓度、磁场旋转和磁强度分别为 40V、20%、20000 RPM 和 220mT。

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来源期刊

Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

5.90

自引率

20.60%

发文量

685

审稿时长

>12 weeks

期刊介绍： The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.