Fulya Basmacı, Esra Nur Avukat, C. Akay, Filiz Aykent
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引用次数: 0
Abstract
To evaluate the effect of incorporating graphene oxide nanoparticles (GO NPs) and graphene sheets on the flexural strength of an auto-polymerized (AP) acrylic resin-repaired denture. 60 heat-activated (HA) resin specimens were fabricated and randomly divided into 6 groups (n = 10). The specimens in Group I were kept intact. 50 specimens were cut into two parts with a 45-degree bevel. Group II specimens were repaired with AP resin and Group III specimens were repaired with HA resin. In the repair of Group IV, Group V, and Group VI specimens, 1%, 2% GO NPs, and graphene sheets were added to AP resin, respectively. A 3-point bending test with a universal test device measured the flexural strength. Statistical analyses of the results were performed with the Kruskal Wallis H-test. (α=0.05) The flexural strength of Group I (130.05±20.20 MPa) was the highest among all groups. The flexural strength of Group IV (67.49±12.70 MPa) was significantly higher than Group V (50.87±15.02 MPa) and Group VI (44.77±10.70 MPa). The lowest strength value was obtained in Group VI. Adding 1% GO NPs to AP acrylic resins increases flexural strength. However, the increase in nanoparticle concentration and the addition of graphene sheets negatively affect strength.
评估加入氧化石墨烯纳米颗粒(GO NPs)和石墨烯薄片对自动聚合(AP)丙烯酸树脂修复义齿抗弯强度的影响。制作了 60 个热激活(HA)树脂试样,并随机分为 6 组(n = 10)。第一组的试样保持原样。50 个试样以 45 度斜角切割成两部分。第二组试样用 AP 树脂修复,第三组试样用 HA 树脂修复。在修复第四组、第五组和第六组试样时,分别在 AP 树脂中添加了 1%、2% 的 GO NPs 和石墨烯片。使用通用测试装置进行的三点弯曲测试测量了弯曲强度。采用 Kruskal Wallis H 检验对结果进行统计分析。(α=0.05)第一组的抗弯强度(130.05±20.20 兆帕)是所有组中最高的。第四组的抗弯强度(67.49±12.70 兆帕)明显高于第五组(50.87±15.02 兆帕)和第六组(44.77±10.70 兆帕)。第六组的强度值最低。在 AP 丙烯酸树脂中添加 1%的 GO 纳米粒子可提高抗折强度。然而,纳米粒子浓度的增加和石墨烯片的添加会对强度产生负面影响。
期刊介绍:
The ECS Journal of Solid State Science and Technology (JSS) was launched in 2012, and publishes outstanding research covering fundamental and applied areas of solid state science and technology, including experimental and theoretical aspects of the chemistry and physics of materials and devices.
JSS has five topical interest areas:
carbon nanostructures and devices
dielectric science and materials
electronic materials and processing
electronic and photonic devices and systems
luminescence and display materials, devices and processing.