Characterizations of Two-photon Absorption Process Induced by Defects in Aluminum Nitride Using Z-scan Method

Jingan Zhou, Tao Li, Xuan Zhao, Xiang Zhang, Jacques Doumani, Mingfei Xu, Ziyi He, S. Luo, Zhaobo Mei, Cheng Chang, Jacob Robinson, P. Ajayan, Junichiro Kono, Yuji Zhao
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Abstract

In this work, we reported two-photon absorption (TPA) measurements for aluminum vacancies in AlN single crystals. We measured the linear transmission and identified the defect levels. Using the Z-scan method, we measured the TPA coefficients of the transitions between defect levels from 380 nm to 735 nm. The transition occurs between the aluminum vacancies defect levels. Furthermore, the power dependence shows good linear fitting, confirming the TPA mechanism. These results will be helpful for the design and fabrication of ultra-low loss waveguides and integrated photonics in the ultraviolet spectral range.
利用 Z 扫描法分析氮化铝缺陷诱发的双光子吸收过程
在这项工作中,我们报告了氮化铝单晶中铝空位的双光子吸收(TPA)测量结果。我们测量了线性透射率并确定了缺陷水平。利用 Z 扫描方法,我们测量了从 380 纳米到 735 纳米的缺陷水平之间跃迁的 TPA 系数。过渡发生在铝空位缺陷水平之间。此外,功率依赖性显示出良好的线性拟合,证实了 TPA 机制。这些结果将有助于设计和制造紫外光谱范围内的超低损耗波导和集成光子学。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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