Advanced lithography materials: From fundamentals to applications

IF 15.9 1区化学 Q1 CHEMISTRY, PHYSICAL

Advances in Colloid and Interface Science Pub Date : 2024-05-19 DOI:10.1016/j.cis.2024.103197

Yanhui Zhang , Haojie Yu , Li Wang , Xudong Wu , Jiawen He , Wenbing Huang , Chengaung Ouyang , Dingning Chen , Basem E. Keshta

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Abstract

The semiconductor industry has long been driven by advances in a nanofabrication technology known as lithography, and the fabrication of nanostructures on chips relies on an important coating, the photoresist layer. Photoresists are typically spin-coated to form a film and have a photolysis solubility transition and etch resistance that allow for rapid fabrication of nanostructures. As a result, photoresists have attracted great interest in both fundamental research and industrial applications. Currently, the semiconductor industry has entered the era of extreme ultraviolet lithography (EUVL) and expects photoresists to be able to fabricate sub-10 nm structures. In order to realize sub-10 nm nanofabrication, the development of photoresists faces several challenges in terms of sensitivity, etch resistance, and molecular size. In this paper, three types of lithographic mechanisms are reviewed to provide strategies for designing photoresists that can enable high-resolution nanofabrication. The discussion of the current state of the art in optical lithography is presented in depth. Practical applications of photoresists and related recent advances are summarized. Finally, the current achievements and remaining issues of photoresists are discussed and future research directions are envisioned.

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先进的光刻材料：从基础到应用

长期以来，半导体行业一直受光刻技术这一纳米制造技术进步的推动，而在芯片上制造纳米结构则依赖于一种重要的涂层--光刻胶层。光刻胶通常通过旋涂形成薄膜，具有光解溶渡和抗蚀刻性，可以快速制造纳米结构。因此，光刻胶在基础研究和工业应用方面都引起了极大的兴趣。目前，半导体行业已进入极紫外光刻（EUVL）时代，并希望光刻胶能够制造出 10 纳米以下的结构。为了实现 10 纳米以下的纳米制造，光刻胶的开发面临着灵敏度、抗蚀刻性和分子尺寸等方面的挑战。本文综述了三种光刻机制，为设计可实现高分辨率纳米制造的光刻胶提供了策略。本文还深入讨论了光学光刻技术的现状。总结了光刻胶的实际应用和相关的最新进展。最后，讨论了光刻胶的现有成就和遗留问题，并展望了未来的研究方向。

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来源期刊

Advances in Colloid and Interface Science 化学-物理化学

CiteScore

28.50

自引率

2.60%

发文量

175

审稿时长

31 days

期刊介绍： "Advances in Colloid and Interface Science" is an international journal that focuses on experimental and theoretical developments in interfacial and colloidal phenomena. The journal covers a wide range of disciplines including biology, chemistry, physics, and technology. The journal accepts review articles on any topic within the scope of colloid and interface science. These articles should provide an in-depth analysis of the subject matter, offering a critical review of the current state of the field. The author's informed opinion on the topic should also be included. The manuscript should compare and contrast ideas found in the reviewed literature and address the limitations of these ideas. Typically, the articles published in this journal are written by recognized experts in the field.