Unveiling the impact and selectivity of BiVO4/rGO-SiO2 adsorbents for arsenic in ground water: An effective approach for the public safety

IF 5.9 3区 工程技术 Q1 CHEMISTRY, MULTIDISCIPLINARY
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Abstract

The presence of arsenic in ground drinking water has become significant threat to the human health. Herein, BiVO4/rGO-SiO2 adsorbents have been synthesized and utilized first time for the arsenic contents (As (III) & As (V)) removal. Morphology and optical properties of adsorbents have been demonstrated via XRD, FTIR, SEM, EDX, XPS and UV–Vis/DRS. For the large scale implementation, water samples were collected from the different areas of district Bahawalpur, Pakistan. During the removal process, As (III) was oxidized to As (V) and then subsequently adsorbed on BiVO4 assisted rGO-SiO2. Thermodynamic and kinetic studies exhibited a higher fitting Langmuir isotherm (R2 = 0.99) and pseudo-second order (R2 = 0.99) respectively. It has been predicted that adsorption of arsenic is an endothermic process that has ΔH° = 49.18 KJ/mol and negative ΔG° = –1.86801 kJ/mol value. It has been estimated that 10 g of adsorbent is sufficient to remove 99.9 % of arsenic contents. On the basis of results, it has been justified that this work holds promise to replace the conventional adsorbents to get arsenic free water.

Abstract Image

Abstract Image

揭示 BiVO4/rGO-SiO2 吸附剂对地下水中砷的影响和选择性:保护公众安全的有效方法
地下饮用水中砷的存在已严重威胁到人类健康。本文首次合成并利用 BiVO4/rGO-SiO2 吸附剂去除砷含量(As (III) & As (V))。吸附剂的形态和光学特性已通过 XRD、FTIR、SEM、EDX、XPS 和 UV-Vis/DRS 得到证实。为了大规模实施,从巴基斯坦巴哈瓦尔布尔地区的不同区域收集了水样。在去除过程中,As (III) 被氧化成 As (V),随后吸附在 BiVO4 辅助的 rGO-SiO2 上。热力学和动力学研究分别显示了拟合度较高的朗缪尔等温线(R2 = 0.99)和假二阶(R2 = 0.99)。据预测,砷的吸附是一个内热过程,ΔH° = 49.18 KJ/mol,负 ΔG° = -1.86801 kJ/mol。据估计,10 克吸附剂足以去除 99.9% 的砷含量。根据这些结果,可以证明这项研究有望取代传统的吸附剂,获得无砷水。
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来源期刊
CiteScore
10.40
自引率
6.60%
发文量
639
审稿时长
29 days
期刊介绍: Journal of Industrial and Engineering Chemistry is published monthly in English by the Korean Society of Industrial and Engineering Chemistry. JIEC brings together multidisciplinary interests in one journal and is to disseminate information on all aspects of research and development in industrial and engineering chemistry. Contributions in the form of research articles, short communications, notes and reviews are considered for publication. The editors welcome original contributions that have not been and are not to be published elsewhere. Instruction to authors and a manuscript submissions form are printed at the end of each issue. Bulk reprints of individual articles can be ordered. This publication is partially supported by Korea Research Foundation and the Korean Federation of Science and Technology Societies.
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