Woohyun Jung, Hyungsik Kim, Konstantin Mishchik, Kisang Lee, Jekil Ryu, Seung Joo Lee, Seong Ho Jeong, Cheol Lae Roh
{"title":"Direct laser patterning of glass mask for micro display using GHz bursts","authors":"Woohyun Jung, Hyungsik Kim, Konstantin Mishchik, Kisang Lee, Jekil Ryu, Seung Joo Lee, Seong Ho Jeong, Cheol Lae Roh","doi":"10.1002/jsid.1308","DOIUrl":null,"url":null,"abstract":"<p>Development of high-precision RGB patterning process is needed to implement high-resolution micro display (OLEDoS) for next-generation VR/AR products. In general, specially designed and manufactured masks are required to realize above 3000-ppi high-resolution display in structured OLED material deposition. In this study, we developed direct laser patterning IR-fs optical system operating in MHz and GHz burst modes and evaluated its capability for precise micro-drilling of aluminoborosilicate glass materials. The fine hole-shaped pattern is produced at a minimum of 5 μm pitch level for about 0.6 in. area without sacrificing the glass strength. It is expected to contribute to the high precise manufacture of ultra fine mask (UFM) using thin glass platform corresponding to micro displays in the future.</p>","PeriodicalId":49979,"journal":{"name":"Journal of the Society for Information Display","volume":null,"pages":null},"PeriodicalIF":1.7000,"publicationDate":"2024-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the Society for Information Display","FirstCategoryId":"5","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/jsid.1308","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Development of high-precision RGB patterning process is needed to implement high-resolution micro display (OLEDoS) for next-generation VR/AR products. In general, specially designed and manufactured masks are required to realize above 3000-ppi high-resolution display in structured OLED material deposition. In this study, we developed direct laser patterning IR-fs optical system operating in MHz and GHz burst modes and evaluated its capability for precise micro-drilling of aluminoborosilicate glass materials. The fine hole-shaped pattern is produced at a minimum of 5 μm pitch level for about 0.6 in. area without sacrificing the glass strength. It is expected to contribute to the high precise manufacture of ultra fine mask (UFM) using thin glass platform corresponding to micro displays in the future.
期刊介绍:
The Journal of the Society for Information Display publishes original works dealing with the theory and practice of information display. Coverage includes materials, devices and systems; the underlying chemistry, physics, physiology and psychology; measurement techniques, manufacturing technologies; and all aspects of the interaction between equipment and its users. Review articles are also published in all of these areas. Occasional special issues or sections consist of collections of papers on specific topical areas or collections of full length papers based in part on oral or poster presentations given at SID sponsored conferences.