Investigation of the effect of halide counterions on the potential corrosion inhibitor in imidazolium-based ionic liquids

IF 1.4 4区 化学 Q4 CHEMISTRY, INORGANIC & NUCLEAR
Abdelmajeed Adam Lagum , Saroj Sharma , Anupam Yadav , Parminder Singh , Shakir Mahmood Saeed , Russul R. Abbass , Ali H. Hameed , Mustafa M. Kadhim
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引用次数: 0

Abstract

Imidazolium (IMZ)-based ionic liquids (ILs) with various counter ions were investigated as potential corrosion inhibitors. Furthermore, parameters such as bond lengths, bond angles, and dihedral bonds were investigated to demonstrate the adsorption sites of molecules. Moreover, in order to compare the efficiency of the inhibitors, other parameters such as energy gap, hardness, the LUMO, and the HOMO were investigated. The HOMO and LUMO values increased from −4.370 and −0.106 eV to −4.959 and −0.156 eV, respectively, by changing F to I. Moreover, the softness of the IMZ base changed from 0.469 to 0.417 eV by increasing the radius of the halide ion. The trend of the band gap value in going from F to I changes from 4.264 to 4.797 eV. The total electron density was computed to show the adsorption sites based on the electron density. According to the molecular reactivity results, the inhibitory efficiency of the inhibitors was in the following order: BMI-F > BMI-Cl > BMI-Br > BMI-I. Investigating the IMZ-based ILs with various counterions to evaluate the inhibition profile of molecules provides useful insights into computational protocols for the study of corrosion inhibitors.

研究卤化物反离子对咪唑基离子液体中潜在缓蚀剂的影响
研究人员将含有各种反离子的咪唑(IMZ)基离子液体(ILs)作为潜在的腐蚀抑制剂进行了研究。此外,还研究了键长、键角和二面键等参数,以证明分子的吸附位点。此外,为了比较抑制剂的效率,还研究了能隙、硬度、LUMO 和 HOMO 等其他参数。将 F- 改为 I- 后,HOMO 和 LUMO 值分别从 -4.370 和 -0.106 eV 增加到 -4.959 和 -0.156 eV。此外,随着卤离子半径的增加,IMZ 基的软度也从 0.469 eV 变为 0.417 eV。从 F- 到 I- 的带隙值的变化趋势是从 4.264 到 4.797 eV。根据电子密度计算了总电子密度,以显示吸附位点。根据分子反应性结果,抑制剂的抑制效率按以下顺序排列:BMI-F;BMI-Cl;BMI-Br;BMI-I。通过研究含有各种反离子的 IMZ 基 IL 来评估分子的抑制曲线,为研究腐蚀抑制剂的计算方案提供了有益的启示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
2.60
自引率
7.70%
发文量
103
审稿时长
2.1 months
期刊介绍: Phosphorus, Sulfur, and Silicon and the Related Elements is a monthly publication intended to disseminate current trends and novel methods to those working in the broad and interdisciplinary field of heteroatom chemistry.
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