{"title":"Liquid phase epitaxy of GaN films on sapphire substrates under an atmospheric pressure nitrogen ambience","authors":"Masataka Katsuumi, Tetsuya Akasaka","doi":"10.35848/1347-4065/ad4cc9","DOIUrl":null,"url":null,"abstract":"\n GaN films were grown on sapphire substrates using liquid phase epitaxy under an atmospheric pressure nitrogen ambience, employing molten Ga and Fe3N as a source mixture. Single-crystal GaN (0001) films were successfully grown on sapphire (0001) substrates within a growth temperature (Tg) range of 750 to 900 oC. When varying the Fe3N concentration in the range of 0.05 to 3 mol%, lower iron nitride resulted in high crystallinity of GaN (0001) films. The incorporation of iron atoms in GaN can negatively impact crystal quality. Parameterizing Tg at a concentration of 0.1 mol% Fe3N showed that a reduction in the peak width of GaN (0002) X-ray rocking curves. However, at 3 mol%, elevating Tg resulted in the degradation of the crystallinity of GaN. This degradation may be attributed to the increased solubility of iron atoms in GaN with increasing Tg.","PeriodicalId":505044,"journal":{"name":"Japanese Journal of Applied Physics","volume":"24 16","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Japanese Journal of Applied Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.35848/1347-4065/ad4cc9","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
GaN films were grown on sapphire substrates using liquid phase epitaxy under an atmospheric pressure nitrogen ambience, employing molten Ga and Fe3N as a source mixture. Single-crystal GaN (0001) films were successfully grown on sapphire (0001) substrates within a growth temperature (Tg) range of 750 to 900 oC. When varying the Fe3N concentration in the range of 0.05 to 3 mol%, lower iron nitride resulted in high crystallinity of GaN (0001) films. The incorporation of iron atoms in GaN can negatively impact crystal quality. Parameterizing Tg at a concentration of 0.1 mol% Fe3N showed that a reduction in the peak width of GaN (0002) X-ray rocking curves. However, at 3 mol%, elevating Tg resulted in the degradation of the crystallinity of GaN. This degradation may be attributed to the increased solubility of iron atoms in GaN with increasing Tg.