Perspective on electrically active defects in β-Ga2O3 from deep-level transient spectroscopy and first-principles calculations

Amanda Langørgen, Lasse Vines, Y. Kalmann Frodason
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Abstract

The ultra-wide bandgap of gallium oxide provides a rich plethora of electrically active defects. Understanding and controlling such defects is of crucial importance in mature device processing. Deep-level transient spectroscopy is one of the most sensitive techniques for measuring electrically active defects in semiconductors and, hence, a key technique for progress toward gallium oxide-based components, including Schottky barrier diodes and field-effect transistors. However, deep-level transient spectroscopy does not provide chemical or configurational information about the defect signature and must, therefore, be combined with other experimental techniques or theoretical modeling to gain a deeper understanding of the defect physics. Here, we discuss the current status regarding the identification of electrically active defects in beta-phase gallium oxide, as observed by deep-level transient spectroscopy and supported by first-principles defect calculations based on the density functional theory. We also discuss the coordinated use of the experiment and theory as a powerful approach for studying electrically active defects and highlight some of the interesting but challenging issues related to the characterization and control of defects in this fascinating material.
从深层次瞬态光谱和第一原理计算透视 β-Ga2O3 中的电活性缺陷
氧化镓的超宽带隙提供了大量丰富的电活性缺陷。了解和控制这些缺陷对于成熟的器件加工至关重要。深电平瞬态光谱法是测量半导体中电活性缺陷的最灵敏技术之一,因此也是开发基于氧化镓的元件(包括肖特基势垒二极管和场效应晶体管)的关键技术。然而,深层次瞬态光谱并不能提供有关缺陷特征的化学或构型信息,因此必须与其他实验技术或理论建模相结合,才能更深入地了解缺陷物理。在此,我们讨论了通过深层瞬态光谱观察到的、基于密度泛函理论的第一原理缺陷计算所支持的 beta 相氧化镓中电活性缺陷的识别现状。我们还讨论了如何协调使用实验和理论作为研究电活性缺陷的有力方法,并强调了与这种迷人材料中缺陷的表征和控制有关的一些有趣但具有挑战性的问题。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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