Study of curtaining effect reduction methods in Inconel 718 using a plasma focused ion beam

IF 1.5 4区 工程技术 Q3 MICROSCOPY
F. Jaime, S. Desbief, J. Silvent, G. Goupil, M. Bernacki, N. Bozzolo, A. Nicolaÿ
{"title":"Study of curtaining effect reduction methods in Inconel 718 using a plasma focused ion beam","authors":"F. Jaime,&nbsp;S. Desbief,&nbsp;J. Silvent,&nbsp;G. Goupil,&nbsp;M. Bernacki,&nbsp;N. Bozzolo,&nbsp;A. Nicolaÿ","doi":"10.1111/jmi.13320","DOIUrl":null,"url":null,"abstract":"<p>The curtaining effect is a common challenge in focused ion beam (FIB) surface preparation. This study investigates methods to reduce this effect during plasma FIB milling of Inconel 718 (nickel-based superalloy). Platinum deposition, silicon mask and XeF<sub>2</sub> gas injection were explored as potential solutions. These methods were evaluated for two ion beam current conditions; a high ion beam intensity condition (30 kV–1 µA) and a medium one (30 kV–100 nA) and their impact on curtaining reduction and resulting cross-section quality was assessed quantitatively thanks to topographic measurements done by atomic force microscopy (AFM). XeF<sub>2</sub> assistance notably improved cross-section quality at medium current level. Pt deposition and Si mask individually mitigated the curtaining effect, with greater efficacy at 100 nA. Both methods also contributed to reducing cross-section curvature, with the Si mask outperforming Pt deposition. However, combining Pt deposition and Si mask with XeF<sub>2</sub> injection led to deterioration of these protective layers and the reappearance of the curtaining effect after a quite short exposure time.</p>","PeriodicalId":16484,"journal":{"name":"Journal of microscopy","volume":null,"pages":null},"PeriodicalIF":1.5000,"publicationDate":"2024-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of microscopy","FirstCategoryId":"5","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1111/jmi.13320","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MICROSCOPY","Score":null,"Total":0}
引用次数: 0

Abstract

The curtaining effect is a common challenge in focused ion beam (FIB) surface preparation. This study investigates methods to reduce this effect during plasma FIB milling of Inconel 718 (nickel-based superalloy). Platinum deposition, silicon mask and XeF2 gas injection were explored as potential solutions. These methods were evaluated for two ion beam current conditions; a high ion beam intensity condition (30 kV–1 µA) and a medium one (30 kV–100 nA) and their impact on curtaining reduction and resulting cross-section quality was assessed quantitatively thanks to topographic measurements done by atomic force microscopy (AFM). XeF2 assistance notably improved cross-section quality at medium current level. Pt deposition and Si mask individually mitigated the curtaining effect, with greater efficacy at 100 nA. Both methods also contributed to reducing cross-section curvature, with the Si mask outperforming Pt deposition. However, combining Pt deposition and Si mask with XeF2 injection led to deterioration of these protective layers and the reappearance of the curtaining effect after a quite short exposure time.

利用等离子体聚焦离子束研究减少铬镍铁合金 718 中帘幕效应的方法。
帘幕效应是聚焦离子束 (FIB) 表面制备过程中常见的难题。本研究探讨了在对 Inconel 718(镍基超级合金)进行等离子 FIB 铣削时减少这种效应的方法。铂沉积、硅掩膜和 XeF2 气体注入被视为潜在的解决方案。在两种离子束电流条件下对这些方法进行了评估:高离子束强度条件(30 kV-1 µA)和中等离子束强度条件(30 kV-100 nA),并通过原子力显微镜(AFM)进行形貌测量,定量评估了它们对帘布减少和由此产生的截面质量的影响。在中等电流水平下,XeF2 的帮助显著提高了横截面质量。铂沉积和硅掩膜分别减轻了帘幕效应,在 100 nA 时效果更好。这两种方法也都有助于减少横截面曲率,其中硅掩膜的效果优于铂沉积。然而,将铂沉积和硅掩膜与注入 XeF2 结合使用,会导致这些保护层退化,并在很短的暴露时间后再次出现帘幕效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of microscopy
Journal of microscopy 工程技术-显微镜技术
CiteScore
4.30
自引率
5.00%
发文量
83
审稿时长
1 months
期刊介绍: The Journal of Microscopy is the oldest journal dedicated to the science of microscopy and the only peer-reviewed publication of the Royal Microscopical Society. It publishes papers that report on the very latest developments in microscopy such as advances in microscopy techniques or novel areas of application. The Journal does not seek to publish routine applications of microscopy or specimen preparation even though the submission may otherwise have a high scientific merit. The scope covers research in the physical and biological sciences and covers imaging methods using light, electrons, X-rays and other radiations as well as atomic force and near field techniques. Interdisciplinary research is welcome. Papers pertaining to microscopy are also welcomed on optical theory, spectroscopy, novel specimen preparation and manipulation methods and image recording, processing and analysis including dynamic analysis of living specimens. Publication types include full papers, hot topic fast tracked communications and review articles. Authors considering submitting a review article should contact the editorial office first.
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