Cover Picture: Contrib. Plasma Phys. 04/2024

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

Contributions to Plasma Physics Pub Date : 2024-05-16 DOI:10.1002/ctpp.880

引用次数: 0

Abstract

(a) Electron current density, z-component; (b) Electric field intensity (V/m); filament line: electron flow. Fig.6 of the paper by Yiqun Ma et al. https://doi.org/10.1002/ctpp.202300169

Abstract Image

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封面图片：Contrib.Plasma Phys.

(a) 电子电流密度，z 分量；(b) 电场强度（V/m）；灯丝线：电子流。马依群等人的论文图 6 https://doi.org/10.1002/ctpp.202300169

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Contributions to Plasma Physics 物理-物理：流体与等离子体

CiteScore

2.90

自引率

12.50%

发文量

110

审稿时长

4-8 weeks

期刊介绍： Aims and Scope of Contributions to Plasma Physics: Basic physics of low-temperature plasmas; Strongly correlated non-ideal plasmas; Dusty Plasmas; Plasma discharges - microplasmas, reactive, and atmospheric pressure plasmas; Plasma diagnostics; Plasma-surface interaction; Plasma technology; Plasma medicine.