Development of Micro/Nano Pattern Arrays with Grating-Based Periodic Structures using the Direct Laser Lithography System

IF 1.4 4区 材料科学 Q4 BIOTECHNOLOGY & APPLIED MICROBIOLOGY
Rency Rajan, Alfred Kirubaraj, S. Senith, Shajin Prince, S.R. Jino Ramson
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引用次数: 0

Abstract

Introduction: This research delves into utilizing the Direct Laser Lithography System to produce micro/nanopattern arrays with grating-based periodic structures. Initially, refining the variation in periodic structures within these arrays becomes a pivotal pursuit. This demands a deep comprehension of how structural variation aligns with specific applications, particularly in photonics and material science. Method: Advancements in hardware, software, or process optimization techniques hold potential for reaching this objective. Using an optical beam, this system enables the engraving of moderate periodic and quasi-periodic structures, enhancing pattern formation in a three-dimensional environment. Through cost-effective direct-beam interferometry systems utilizing 405 nm GaN and 290 to 780 nm AlInGaN semiconductor laser diodes, patterns ranging from in period were created, employing 300 nm gratings. Result: The system's cost-efficiency and ability to achieve high-resolution permit the creation of both regular and irregular grating designs. By employing an optical head assembly from a bluray disc recorder, housing a semiconductor laser diode and an objective lens with an NA of 0.85, this system displays promising potential in progressing the fabrication of micro/nanopattern arrays. Conclusion: Assessing their optical, mechanical, and electrical properties and exploring potential applications across varied fields like optoelectronics, photovoltaics, sensors, and biomedical devices represent critical strides for further exploration and advancement.
利用直接激光光刻系统开发基于光栅周期结构的微/纳米图案阵列
导言:本研究深入探讨如何利用直接激光光刻系统制作具有基于光栅的周期性结构的微/纳米图案阵列。起初,完善这些阵列中周期性结构的变化是一项关键的任务。这就要求深入理解结构变化如何与特定应用相匹配,尤其是在光子学和材料科学领域。方法:硬件、软件或流程优化技术的进步为实现这一目标提供了可能。该系统使用光束,可雕刻中等周期和准周期结构,增强三维环境中的图案形成。通过使用 405 nm GaN 和 290 至 780 nm AlInGaN 半导体激光二极管的高性价比直接光束干涉测量系统,利用 300 nm 光栅制作出了周期不等的图案。结果:该系统的成本效益和实现高分辨率的能力允许创建规则和不规则光栅设计。该系统采用蓝光光盘刻录机的光学头组件,容纳一个半导体激光二极管和一个 NA 值为 0.85 的物镜,在微/纳米图案阵列的制作方面显示出巨大的潜力。结论评估微/纳米图案阵列的光学、机械和电气特性,探索其在光电、光伏、传感器和生物医学设备等不同领域的潜在应用,是进一步探索和进步的关键步骤。
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来源期刊
Current Nanoscience
Current Nanoscience 工程技术-材料科学:综合
CiteScore
3.50
自引率
6.70%
发文量
83
审稿时长
4.4 months
期刊介绍: Current Nanoscience publishes (a) Authoritative/Mini Reviews, and (b) Original Research and Highlights written by experts covering the most recent advances in nanoscience and nanotechnology. All aspects of the field are represented including nano-structures, nano-bubbles, nano-droplets and nanofluids. Applications of nanoscience in physics, material science, chemistry, synthesis, environmental science, electronics, biomedical nanotechnology, biomedical engineering, biotechnology, medicine and pharmaceuticals are also covered. The journal is essential to all researches involved in nanoscience and its applied and fundamental areas of science, chemistry, physics, material science, engineering and medicine. Current Nanoscience also welcomes submissions on the following topics of Nanoscience and Nanotechnology: Nanoelectronics and photonics Advanced Nanomaterials Nanofabrication and measurement Nanobiotechnology and nanomedicine Nanotechnology for energy Sensors and actuator Computational nanoscience and technology.
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