T.U. Schülli, E Dollekamp, Z Ismaili, N. Nawaz, T. Januel, T. Billo, P. Brumund, H. Djazouli, S.J. Leake, M. Jankowski, V. Reita, M. Rodriguez, L. André, A. Aliane, Y.M. Le Vaillant
{"title":"Dynamic and controlled stretching of macroscopic crystalline membranes towards unprecedented levels","authors":"T.U. Schülli, E Dollekamp, Z Ismaili, N. Nawaz, T. Januel, T. Billo, P. Brumund, H. Djazouli, S.J. Leake, M. Jankowski, V. Reita, M. Rodriguez, L. André, A. Aliane, Y.M. Le Vaillant","doi":"10.1016/j.mtadv.2024.100489","DOIUrl":null,"url":null,"abstract":"Imposing and controlling strain in materials such as semiconductors or ferroelectrics is a promising way to obtain new or enhance existing properties. Although the field of strain engineering has seen a rapid expansion over the last two decades, straining semiconductor membranes over large areas remains a challenge. A generic way of tuning strain and hence band structure and electric or magnetic properties of any crystalline material can be obtained by compression of a composite structure involving poorly compressible elastomers. Mechanically similar to the principle of a hydraulic press, this work proposes a device and describes analytically a methodology to easily strain macroscopic membranes up to unprecedented values. Using X-ray diffraction and Raman spectroscopy, we tuned the biaxial strain in silicon membranes up to a value of 2.1 %, paving the way for new studies in the field of strain related physics, from semiconductors to perovskite oxide multiferroics.","PeriodicalId":48495,"journal":{"name":"Materials Today Advances","volume":"47 1","pages":""},"PeriodicalIF":8.1000,"publicationDate":"2024-04-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Today Advances","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1016/j.mtadv.2024.100489","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Imposing and controlling strain in materials such as semiconductors or ferroelectrics is a promising way to obtain new or enhance existing properties. Although the field of strain engineering has seen a rapid expansion over the last two decades, straining semiconductor membranes over large areas remains a challenge. A generic way of tuning strain and hence band structure and electric or magnetic properties of any crystalline material can be obtained by compression of a composite structure involving poorly compressible elastomers. Mechanically similar to the principle of a hydraulic press, this work proposes a device and describes analytically a methodology to easily strain macroscopic membranes up to unprecedented values. Using X-ray diffraction and Raman spectroscopy, we tuned the biaxial strain in silicon membranes up to a value of 2.1 %, paving the way for new studies in the field of strain related physics, from semiconductors to perovskite oxide multiferroics.
期刊介绍:
Materials Today Advances is a multi-disciplinary, open access journal that aims to connect different communities within materials science. It covers all aspects of materials science and related disciplines, including fundamental and applied research. The focus is on studies with broad impact that can cross traditional subject boundaries. The journal welcomes the submissions of articles at the forefront of materials science, advancing the field. It is part of the Materials Today family and offers authors rigorous peer review, rapid decisions, and high visibility.