Interdigitated-back-contacted silicon heterojunction solar cells featuring novel MoOx-based contact stacks

IF 8 2区 材料科学 Q1 ENERGY & FUELS
Katarina Kovačević, Yifeng Zhao, Paul Procel, Liqi Cao, Luana Mazzarella, Olindo Isabella
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引用次数: 0

Abstract

The fabrication process of interdigitated-back-contacted silicon heterojunction (IBC-SHJ) solar cells has been significantly simplified with the development of the so-called tunnel-IBC architecture. This architecture utilizes a highly conductive (p)-type nanocrystalline silicon (nc-Si:H) layer deposited over the full substrate area comprising pre-patterned (n)-type nc-Si:H fingers. In this context, the (p)-type nc-Si:H layer is referred to as blanket layer. As both electrodes are connected to the same blanket layer, the high lateral conductivity of (p)nc-Si:H layer can potentially lead to relatively low shunt resistance in the device, thus limiting the performance of such solar cells. To overcome such limitation, we introduce a thin (<2 nm) full-area molybdenum oxide (MoOx) layer as an alternative to the (p)nc-Si:H blanket layer. We demonstrate that the use of such a thin MoOx minimizes the shunting losses thanks to its low lateral conductivity while preserving the simplified fabrication process. In this process, a novel (n)-type nc-Si:H/MoOx electron collection contact stack is implemented within the proposed solar cell architecture. We assess its transport mechanisms via electrical simulations showing that electron transport, unlike in the case of tunnel-IBC, occurs in the conduction band fully. Moreover, the proposed contact stack is evaluated in terms of contact resistivity and integrated into a proof-of-concept front/back-contacted (FBC) SHJ solar cells. Contact resistivity as low as 100 mΩcm2 is achieved, and fabricated FBC-SHJ solar cells obtain a fill factor above 81.5% and open-circuit voltage above 705 mV. Lastly, the IBC-SHJ solar cells featuring the MoOx blanket layer are fabricated, exhibiting efficiencies up to 21.14% with high shunt resistances above 150 kΩcm2. Further optimizations in terms of layer properties and fabrication process are proposed to improve device performance and realize the efficiency potential of our novel IBC-SHJ solar cell architecture.

Abstract Image

Abstract Image

采用基于氧化钼的新型接触叠层的互插背接触硅异质结太阳能电池
随着所谓的隧道式 IBC 结构的开发,互插背接触硅异质结 (IBC-SHJ) 太阳能电池的制造工艺得到了显著简化。这种结构利用高导电性(p)型纳米晶硅(nc-Si:H)层沉积在由预图案化(n)型 nc-Si:H 手指组成的整个衬底区域上。在这种情况下,(p)型 nc-Si:H 层被称为空白层。由于两个电极都连接到同一层毯子层,(p)型 nc-Si:H 层的高横向导电性有可能导致器件中的分流电阻相对较低,从而限制了此类太阳能电池的性能。为了克服这种限制,我们引入了一层薄的(2 nm)全面积氧化钼(MoOx)层来替代(p)nc-Si:H 毯状层。我们证明,由于氧化钼的横向导电率较低,使用这种薄氧化钼可以最大限度地减少分流损耗,同时保留简化的制造工艺。在这一过程中,一个新颖的(n)型 nc-Si:H/MoOx 电子收集接触堆栈被应用于所提出的太阳能电池结构中。我们通过电学模拟对其传输机制进行了评估,结果表明,与隧道式 IBC 不同,电子传输完全发生在导带中。此外,我们还从接触电阻率的角度对所提出的接触堆进行了评估,并将其集成到概念验证的前/后接触(FBC)SHJ 太阳能电池中。接触电阻率低至 100 mΩcm2,制造出的 FBC-SHJ 太阳能电池的填充因子超过 81.5%,开路电压超过 705 mV。最后,制造出了具有氧化钼毯层的 IBC-SHJ 太阳能电池,其效率高达 21.14%,并联电阻超过 150 kΩcm2。我们还提出了进一步优化层特性和制造工艺的建议,以提高器件性能,实现新型 IBC-SHJ 太阳能电池结构的效率潜力。
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来源期刊
Progress in Photovoltaics
Progress in Photovoltaics 工程技术-能源与燃料
CiteScore
18.10
自引率
7.50%
发文量
130
审稿时长
5.4 months
期刊介绍: Progress in Photovoltaics offers a prestigious forum for reporting advances in this rapidly developing technology, aiming to reach all interested professionals, researchers and energy policy-makers. The key criterion is that all papers submitted should report substantial “progress” in photovoltaics. Papers are encouraged that report substantial “progress” such as gains in independently certified solar cell efficiency, eligible for a new entry in the journal''s widely referenced Solar Cell Efficiency Tables. Examples of papers that will not be considered for publication are those that report development in materials without relation to data on cell performance, routine analysis, characterisation or modelling of cells or processing sequences, routine reports of system performance, improvements in electronic hardware design, or country programs, although invited papers may occasionally be solicited in these areas to capture accumulated “progress”.
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