Yuting Li, Guangying Wang, Qinchen Lin, Shuwen Xie, Wentao Zhang, Timothy Shih, Jonathan Vigen, S. Mukhopadhyay, S. Pasayat, Chirag Gupta
{"title":"Optimization of p-type contact for electrical injection and light extraction for 365nm UV-A LEDs","authors":"Yuting Li, Guangying Wang, Qinchen Lin, Shuwen Xie, Wentao Zhang, Timothy Shih, Jonathan Vigen, S. Mukhopadhyay, S. Pasayat, Chirag Gupta","doi":"10.1088/1361-6641/ad40c5","DOIUrl":null,"url":null,"abstract":"\n This paper demonstrates low-resistance and high-transparency p-type contact materials for UV micro-LEDs at 365 nm. As a commonly used p-type LED contact, Indium tin oxide (ITO) and nickel/indium tin oxide (Ni/ITO) contacts were studied before and after rapid thermal annealing (RTA) treatments. The transmittance at 365 nm wavelength of 200 nm thick ITO films increased from approximately 57% to 90% after RTA at a temperature exceeding 400°C, while the Ni/ITO film had a transmittance of about 73% after annealing. Micron-sized UV-LEDs (light-emitting diodes) with Ni/ITO p-contact were fabricated. Electrical characterization shows that Ni/ITO films annealed at 600°C demonstrated good ohmic contact behavior and the highest on-wafer external quantum efficiency (EQE), despite slightly lower transmittance. This paper shows the potential of annealed Ni/ITO films as promising p-contact materials for high-performance 365 nm UV-LEDs.","PeriodicalId":507064,"journal":{"name":"Semiconductor Science and Technology","volume":" 6","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6641/ad40c5","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper demonstrates low-resistance and high-transparency p-type contact materials for UV micro-LEDs at 365 nm. As a commonly used p-type LED contact, Indium tin oxide (ITO) and nickel/indium tin oxide (Ni/ITO) contacts were studied before and after rapid thermal annealing (RTA) treatments. The transmittance at 365 nm wavelength of 200 nm thick ITO films increased from approximately 57% to 90% after RTA at a temperature exceeding 400°C, while the Ni/ITO film had a transmittance of about 73% after annealing. Micron-sized UV-LEDs (light-emitting diodes) with Ni/ITO p-contact were fabricated. Electrical characterization shows that Ni/ITO films annealed at 600°C demonstrated good ohmic contact behavior and the highest on-wafer external quantum efficiency (EQE), despite slightly lower transmittance. This paper shows the potential of annealed Ni/ITO films as promising p-contact materials for high-performance 365 nm UV-LEDs.