Nickel–silicon interfacial adhesion strength measured by laser spallation

Xiao Yan, Jacob M. Diamond, Nathan J. Fritz, Satoshi Matsuo, K. F. Rabbi, Ishrat Zarin, Nenad Miljkovic, P. V. Braun, N. Sottos
{"title":"Nickel–silicon interfacial adhesion strength measured by laser spallation","authors":"Xiao Yan, Jacob M. Diamond, Nathan J. Fritz, Satoshi Matsuo, K. F. Rabbi, Ishrat Zarin, Nenad Miljkovic, P. V. Braun, N. Sottos","doi":"10.1063/5.0198331","DOIUrl":null,"url":null,"abstract":"Thin films of amorphous silicon (a-Si) coated on metals such as nickel (Ni) are one of the most promising anode architectures for high-energy-density lithium-ion (Li-ion) batteries. The performance and longevity of batteries with this type of electrode depend on the integrity of the Ni/a–Si interface. The integrity of the a-Si /Ni bonded interface during cycling is critical, but the experimental characterization of interfacial failure of this material system is highly challenging and there is a sparsity of interface strength data in the literature. Here, we describe a laser spallation (LS) technique to characterize the interfacial adhesion strength of Ni/a–Si multilayer films created by chemical vapor deposition (CVD). The LS technique enables the non-contact measurement of the tensile interfacial strength with high precision when compared to conventional methods for characterizing adhesion. Interferometric measurement combined with finite element analysis shows that the Ni/a–Si interface, created via the CVD of a-Si on Ni surfaces can withstand ≈46–72 MPa in tension before failure initiation. To ensure successful and precise characterization of interfacial adhesion strength using LS, we further develop a design criterion for multi-layer samples by analyzing the thin-film mechanics. Our study provides insights into the strength of the Ni/a–Si interface that governs the performance and durability of high-energy-density anodes and offers design guidelines for improving thin-film electrode integrity.","PeriodicalId":502933,"journal":{"name":"Journal of Applied Physics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Applied Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/5.0198331","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Thin films of amorphous silicon (a-Si) coated on metals such as nickel (Ni) are one of the most promising anode architectures for high-energy-density lithium-ion (Li-ion) batteries. The performance and longevity of batteries with this type of electrode depend on the integrity of the Ni/a–Si interface. The integrity of the a-Si /Ni bonded interface during cycling is critical, but the experimental characterization of interfacial failure of this material system is highly challenging and there is a sparsity of interface strength data in the literature. Here, we describe a laser spallation (LS) technique to characterize the interfacial adhesion strength of Ni/a–Si multilayer films created by chemical vapor deposition (CVD). The LS technique enables the non-contact measurement of the tensile interfacial strength with high precision when compared to conventional methods for characterizing adhesion. Interferometric measurement combined with finite element analysis shows that the Ni/a–Si interface, created via the CVD of a-Si on Ni surfaces can withstand ≈46–72 MPa in tension before failure initiation. To ensure successful and precise characterization of interfacial adhesion strength using LS, we further develop a design criterion for multi-layer samples by analyzing the thin-film mechanics. Our study provides insights into the strength of the Ni/a–Si interface that governs the performance and durability of high-energy-density anodes and offers design guidelines for improving thin-film electrode integrity.
通过激光溅射测量镍硅界面粘附强度
涂覆在镍(Ni)等金属上的非晶硅(a-Si)薄膜是高能量密度锂离子(Li-ion)电池最有前途的阳极结构之一。采用这种电极的电池的性能和寿命取决于镍/非晶硅界面的完整性。硅/镍结合界面在循环过程中的完整性至关重要,但这种材料系统界面失效的实验表征极具挑战性,而且文献中的界面强度数据非常稀少。在此,我们介绍了一种激光剥落(LS)技术,用于表征通过化学气相沉积(CVD)形成的镍/a-硅多层薄膜的界面粘附强度。与表征附着力的传统方法相比,LS 技术能够以高精度非接触式测量拉伸界面强度。干涉测量结合有限元分析表明,通过 CVD 在镍表面形成的非晶硅镍/非晶硅界面在失效前可承受 ≈46-72 兆帕的拉力。为确保使用 LS 成功、精确地表征界面粘附强度,我们通过分析薄膜力学进一步制定了多层样品的设计标准。我们的研究深入揭示了影响高能量密度阳极性能和耐用性的镍/a-硅界面强度,并为改善薄膜电极完整性提供了设计指南。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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