Tailoring the mechanical and high‐temperature tribological properties of Si‐DLC films by controlling the Si content

IF 1.6 4区 化学 Q4 CHEMISTRY, PHYSICAL
Weijie Yu, Qiuping Mei, Weijiu Huang, Junjun Wang, Yongyao Su
{"title":"Tailoring the mechanical and high‐temperature tribological properties of Si‐DLC films by controlling the Si content","authors":"Weijie Yu, Qiuping Mei, Weijiu Huang, Junjun Wang, Yongyao Su","doi":"10.1002/sia.7308","DOIUrl":null,"url":null,"abstract":"The poor high‐temperature tribological performance of diamond‐like carbon (DLC) films severely limits their applications. To address this issue, silicon (Si) doped DLC films with Si content ranging from 0 to 11.52 at.% were synthesized utilizing the plasma‐assisted reactive magnetron sputtering technique. The influence of Si incorporation on the microstructure and mechanical properties was meticulously investigated by Raman spectroscopy, scanning electron microscope (SEM), X‐ray photoelectron spectroscopy (XPS), nanoindentation, and scratch testing. To ascertain the tribological behavior of the Si‐DLC films under elevated temperature conditions, in situ high‐temperature tests were conducted, spanning temperatures from ambient to 500°C. The findings indicated that distinct lubrication mechanisms prevail for Si‐DLC films with varying Si content across different temperature domains. As the test temperature and Si content increased, the lubrication mechanism exhibited a gradual transitions from high‐temperature induced graphitization to a particle wear regime dominated by SiC and formed SiO<jats:sub>2</jats:sub> abrasive phases. The comprehensive performance of the films peaked at a Si content of 4.72 at.%, suggesting an optimal composition for high‐temperature applications. It is postulated that the in‐depth investigation presented herein holds considerable value for the design and fabrication of DLC films intended for use in high‐temperature settings, potentially unlocking their full potential in such demanding environments.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"66 1","pages":""},"PeriodicalIF":1.6000,"publicationDate":"2024-04-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface and Interface Analysis","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1002/sia.7308","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
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Abstract

The poor high‐temperature tribological performance of diamond‐like carbon (DLC) films severely limits their applications. To address this issue, silicon (Si) doped DLC films with Si content ranging from 0 to 11.52 at.% were synthesized utilizing the plasma‐assisted reactive magnetron sputtering technique. The influence of Si incorporation on the microstructure and mechanical properties was meticulously investigated by Raman spectroscopy, scanning electron microscope (SEM), X‐ray photoelectron spectroscopy (XPS), nanoindentation, and scratch testing. To ascertain the tribological behavior of the Si‐DLC films under elevated temperature conditions, in situ high‐temperature tests were conducted, spanning temperatures from ambient to 500°C. The findings indicated that distinct lubrication mechanisms prevail for Si‐DLC films with varying Si content across different temperature domains. As the test temperature and Si content increased, the lubrication mechanism exhibited a gradual transitions from high‐temperature induced graphitization to a particle wear regime dominated by SiC and formed SiO2 abrasive phases. The comprehensive performance of the films peaked at a Si content of 4.72 at.%, suggesting an optimal composition for high‐temperature applications. It is postulated that the in‐depth investigation presented herein holds considerable value for the design and fabrication of DLC films intended for use in high‐temperature settings, potentially unlocking their full potential in such demanding environments.
通过控制硅含量定制硅-DLC 薄膜的机械性能和高温摩擦学性能
类金刚石碳(DLC)薄膜的高温摩擦学性能较差,严重限制了其应用。为了解决这个问题,我们利用等离子体辅助反应磁控溅射技术合成了掺硅(Si)的类金刚石碳(DLC)薄膜,含硅量从 0% 到 11.52%。通过拉曼光谱、扫描电子显微镜 (SEM)、X 射线光电子能谱 (XPS)、纳米压痕和划痕测试,仔细研究了掺硅对微观结构和机械性能的影响。为了确定 Si-DLC 薄膜在高温条件下的摩擦学行为,进行了从环境温度到 500°C 的原位高温测试。研究结果表明,不同含硅量的 Si-DLC 薄膜在不同温度范围内具有不同的润滑机制。随着测试温度和硅含量的增加,润滑机制从高温诱导的石墨化逐渐过渡到以 SiC 和形成的 SiO2 研磨相为主的颗粒磨损机制。薄膜的综合性能在 Si 含量为 4.72 at.% 时达到峰值,这表明其成分是高温应用的最佳选择。据推测,本文介绍的深入研究对于设计和制造用于高温环境的 DLC 薄膜具有相当大的价值,有可能在这种苛刻的环境中充分释放其潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Surface and Interface Analysis
Surface and Interface Analysis 化学-物理化学
CiteScore
3.30
自引率
5.90%
发文量
130
审稿时长
4.4 months
期刊介绍: Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).
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