Impedance matching design of capacitively coupled plasma with fluid and external circuit coupled model

IF 2.9 3区 物理与天体物理 Q2 PHYSICS, APPLIED
Lifen Zhao, Shimin Yu, Yu Wang, Zili Chen, Xiangmei Liu, Hongyu Wang, Wei Jiang, Ya Zhang
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引用次数: 0

Abstract

This paper establishes a fully self‐consistent coupled model of fluid and external circuits. The Kirchhoff equation, the charge conservation equation, and Poisson equation are coupled via boundary conditions and integrated into the fluid model for iterative parameter solution. On the basis of this model, we investigate the influence of impedance matching on single‐frequency capacitively coupled plasma characteristics under different parameters and topological structures. The findings suggest that after several iterations the matching parameters converge. Using different initial circuit parameters, the adjustable capacitance and inductance are eventually adjusted to approximately equal values, resulting in the same optimal matching state, whereas diverse discharge parameters led to different outcomes. Under fixed parameters for two topologies, the power absorption efficiency increases, and the reflection coefficient approaches zero, and the best matching is found. This model can be extended to different fluid programs to investigate the impact of complex external circuits with impedance matching network on plasma discharge while simultaneously seeking best impedance matching.

Abstract Image

带流体和外电路耦合模型的电容耦合等离子体的阻抗匹配设计
本文建立了一个完全自洽的流体和外部电路耦合模型。通过边界条件将基尔霍夫方程、电荷守恒方程和泊松方程耦合,并集成到流体模型中进行参数迭代求解。在此模型的基础上,我们研究了不同参数和拓扑结构下阻抗匹配对单频电容耦合等离子体特性的影响。研究结果表明,经过多次迭代后,匹配参数趋于一致。使用不同的初始电路参数,可调电容和电感最终会调整到近似相等的值,从而产生相同的最佳匹配状态,而不同的放电参数会导致不同的结果。在两种拓扑结构的固定参数下,功率吸收效率增加,反射系数趋近于零,找到了最佳匹配。该模型可扩展到不同的流体程序,以研究带有阻抗匹配网络的复杂外部电路对等离子体放电的影响,同时寻求最佳阻抗匹配。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Plasma Processes and Polymers
Plasma Processes and Polymers 物理-高分子科学
CiteScore
6.60
自引率
11.40%
发文量
150
审稿时长
3 months
期刊介绍: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
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