The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades

Winfried Kaiser
{"title":"The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades","authors":"Winfried Kaiser","doi":"10.1109/MED.2023.3343627","DOIUrl":null,"url":null,"abstract":"EUV is currently the state-of-the-art lithography technology used to print the most critical layers of ICs, specifically of advanced logic and DRAM. It represents the highest achievement in the industry after decades of development of optical lithography.","PeriodicalId":491767,"journal":{"name":"IEEE Electron Devices Magazine","volume":"17 1","pages":"23-34"},"PeriodicalIF":0.0000,"publicationDate":"2024-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Devices Magazine","FirstCategoryId":"0","ListUrlMain":"https://doi.org/10.1109/MED.2023.3343627","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

EUV is currently the state-of-the-art lithography technology used to print the most critical layers of ICs, specifically of advanced logic and DRAM. It represents the highest achievement in the industry after decades of development of optical lithography.
光刻光学技术向先进的超紫外光刻发展:让摩尔定律延续六十年
EUV 是目前最先进的光刻技术,用于印刷集成电路最关键的层,特别是高级逻辑和 DRAM。它代表了光学光刻技术经过数十年发展后所取得的最高成就。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信