Water-based direct photopatterning of stretchable PEDOT:PSS using amphiphilic block copolymers

Abstract

The use of water-based chemistry in photolithography during semiconductor fabrication is desirable due to its cost-effectiveness and minimal environmental impact, especially considering the large scale of semiconductor production. Despite these benefits, limited research has reported successful demonstrations of water-based photopatterning, particularly for intrinsically water-soluble materials such as Poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) due to significant challenges in achieving selective dissolution during the developing process. In this paper, we propose a method for the direct patterning of PEDOT:PSS in water by introducing an amphiphilic Poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol) (PEO-PPO-PEO, P123) block copolymer to the PEDOT:PSS film. The addition of the block copolymer enhances the stretchability of the composite film and reduces the hydrophilicity of the film surface, allowing for water absorption only after UV exposure through a photoinitiated reaction with benzophenone. We apply this technique to fabricate tactile and wearable biosensors, both of which benefit from the mechanical stretchability and transparency of PEDOT:PSS. Our method represents a promising solution for water-based photopatterning of hydrophilic materials, with potential for wider applications in semiconductor fabrication.