Serhii I. Kuryshchuk, Galyna O. Andrushchak, Taras T. Kovaliuk, Andriy I. Mostovyi, Hryhorii P. Parkhomenko, Sanjay H. Sahare, Mykhailo M. Solovan, Viktor V. Brus
{"title":"Simulation and numerical modeling of CuO films thickness influence on the efficiency of graphite/CuO/Ni solar cells","authors":"Serhii I. Kuryshchuk, Galyna O. Andrushchak, Taras T. Kovaliuk, Andriy I. Mostovyi, Hryhorii P. Parkhomenko, Sanjay H. Sahare, Mykhailo M. Solovan, Viktor V. Brus","doi":"10.1002/jnm.3230","DOIUrl":null,"url":null,"abstract":"<p>Copper oxide is one of the original semiconductor materials employed for solar cells in the early 19th century before Silicon solar cells became popular due to their abundant availability, and eco-friendly nature. The optoelectronic parameters signify its huge potential in solar cell devices, though it's far from the theoretically predicted performance, provides tremendous scope to improve the solar cell performance by forming different heterojunctions. In this study, we investigated the copper oxide's (CuO) potential as an active layer in thin-film solar cells theoretically with a new structure consisting of a Glass/ITO/Graphite/CuO/Ni. Furthermore, the charge carrier's generation rate and theoretical thresholds for photovoltaic device efficiency were determined for varying active layer thicknesses by employing a normalized light intensity equivalent to that of the AM1.5 spectrum. The optimized performance of the simulated structure by considering realistic optical parameters of the solar cell was ~24%, obtained for the 500 nm CuO films. The performed theoretical work can help to employ CuO and boost the performance of solar cells experimentally.</p>","PeriodicalId":50300,"journal":{"name":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","volume":null,"pages":null},"PeriodicalIF":1.6000,"publicationDate":"2024-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","FirstCategoryId":"5","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/jnm.3230","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Copper oxide is one of the original semiconductor materials employed for solar cells in the early 19th century before Silicon solar cells became popular due to their abundant availability, and eco-friendly nature. The optoelectronic parameters signify its huge potential in solar cell devices, though it's far from the theoretically predicted performance, provides tremendous scope to improve the solar cell performance by forming different heterojunctions. In this study, we investigated the copper oxide's (CuO) potential as an active layer in thin-film solar cells theoretically with a new structure consisting of a Glass/ITO/Graphite/CuO/Ni. Furthermore, the charge carrier's generation rate and theoretical thresholds for photovoltaic device efficiency were determined for varying active layer thicknesses by employing a normalized light intensity equivalent to that of the AM1.5 spectrum. The optimized performance of the simulated structure by considering realistic optical parameters of the solar cell was ~24%, obtained for the 500 nm CuO films. The performed theoretical work can help to employ CuO and boost the performance of solar cells experimentally.
期刊介绍:
Prediction through modelling forms the basis of engineering design. The computational power at the fingertips of the professional engineer is increasing enormously and techniques for computer simulation are changing rapidly. Engineers need models which relate to their design area and which are adaptable to new design concepts. They also need efficient and friendly ways of presenting, viewing and transmitting the data associated with their models.
The International Journal of Numerical Modelling: Electronic Networks, Devices and Fields provides a communication vehicle for numerical modelling methods and data preparation methods associated with electrical and electronic circuits and fields. It concentrates on numerical modelling rather than abstract numerical mathematics.
Contributions on numerical modelling will cover the entire subject of electrical and electronic engineering. They will range from electrical distribution networks to integrated circuits on VLSI design, and from static electric and magnetic fields through microwaves to optical design. They will also include the use of electrical networks as a modelling medium.