Optical Properties of Ferroelectric Films HfxZryO2 and La:HfxZryO2 according to Ellipsometry Data

IF 0.8 4区物理与天体物理 Q4 OPTICS

Optics and Spectroscopy Pub Date : 2024-03-27 DOI:10.1134/s0030400x23050107

V. N. Kruchinin, E. V. Spesivtsev, C. V. Rykhlitsky, V. A. Gritsenko, F. Mehmood, T. Mikolajick, U. Schroeder

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Abstract

Recently ferroelectric properties have been found in hafnia-based nanosized films. Such films are of the utmost interest for development of a universal memory, which combines the advantages of random access memory and flash memory. The paper studies optical properties of hafnia-zirconium oxide films H-f_xZr_yO₂ and lanthanum-alloyed hafnia-zirconium oxide films La:Hf_xZr_yO₂. Fluctuations of thickness in Hf_xZr_yO₂ do not exceed 3.5%, fluctuations of thickness in La:Hf_xZr_yO₂ films—3.2%. Optical properties are analyzed based on effective-medium theory. According to effective-medium theory data, Hf_xZr_yO₂ films contain 46% HfO₂, 54% ZrO₂, La:Hf_xZr_yO₂ films contain 47.5% HfO₂, 52.4% ZrO₂, 2.5% La₂O₃.

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根据椭偏仪数据得出的 HfxZryO2 和 La:HfxZryO2 铁电薄膜的光学特性

摘要最近在基于铪的纳米薄膜中发现了铁电特性。这种薄膜对于开发兼具随机存取存储器和闪存优点的通用存储器具有极大的意义。本文研究了铪氧化锆薄膜 H-fxZryO2 和镧合金铪氧化锆薄膜 La:HfxZryO2 的光学特性。HfxZryO2 的厚度波动不超过 3.5%，La:HfxZryO2 薄膜的厚度波动为 3.2%。根据有效介质理论分析了光学特性。根据有效介质理论数据，HfxZryO2 薄膜中含有 46% 的 HfO2 和 54% 的 ZrO2，La:HfxZryO2 薄膜中含有 47.5% 的 HfO2、52.4% 的 ZrO2 和 2.5% 的 La2O3。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Optics and Spectroscopy 物理-光谱学

CiteScore

1.60

自引率

0.00%

发文量

审稿时长

4.5 months

期刊介绍： Optics and Spectroscopy (Optika i spektroskopiya), founded in 1956, presents original and review papers in various fields of modern optics and spectroscopy in the entire wavelength range from radio waves to X-rays. Topics covered include problems of theoretical and experimental spectroscopy of atoms, molecules, and condensed state, lasers and the interaction of laser radiation with matter, physical and geometrical optics, holography, and physical principles of optical instrument making.

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