Optoelectronic and Dielectric Properties of Tenorite CuO Thin Films Sprayed at Various Molar Concentrations

IF 1.4 4区 工程技术 Q3 ENGINEERING, CHEMICAL
Ouarda Ben Messaoud, A. Ouahab, S. Rahmane, Souheila Hettal, Aicha Kater, Moustefa Sayad, Hafida Attouche, Noureddine Gherraf
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Abstract

The work in hand presents the elaboration of CuO thin films using a home-made spray pyrolysis technique at room atmosphere. The films were synthesized on preheated glass substrate at 450 °C. The source solution molarity was varied from 0.025 to 0.1 mol/L. The films were characterized by employing X-Ray Diffraction technique, UV-Vis-NIR spectrophotometry, Scanning Electron Microscope imagery, Energy Dispersive Spectroscopy, and four-points probe techniques. The X-ray diffraction analysis confirmed that all films are polycrystalline with a preferred orientation along the plane (−111) of the monoclinic crystal structure phase of tenorite (CuO). The SEM images showed a homogeneous and smooth surface. Crystallinity and grain size were improved. The rise of solution concentration induced a reduction of transmittance and reflectance in the visible region. The energy gap, the absorption coefficient, the extinction coefficient, refractive index, dielectric constant (ԑr and ԑi) and loss energy were estimated from transmittance and reflectance data. The gap energy decreases from 2.72 to 2.56 eV. The film deposited for 0.025 mol/L exhibits the highest real part of the dielectric constant (ԑr ~ 17). The film resistivity which is in order of 102 Ω cm decreases with the increase of molar concentration. The estimated dielectric constant indicated that the resulting CuO thin films could be used as dielectric layers for optoelectronic devices working in Vis-NIR region of radiation. Furthermore, the relatively high band gap, high absorption coefficient and high conductivity of the film obtained at 0.075 mol/L, make them good candidates as absorption layers in solar cells applications.
不同摩尔浓度下喷涂的特诺赖特氧化铜薄膜的光电和介电特性
本作品介绍了在室温下利用自制喷雾热解技术制备氧化铜薄膜的情况。薄膜是在 450 °C 的预热玻璃基底上合成的。源溶液摩尔浓度在 0.025 至 0.1 摩尔/升之间变化。利用 X 射线衍射技术、紫外-可见-近红外分光光度法、扫描电子显微镜图像、能量色散光谱法和四点探针技术对薄膜进行了表征。X 射线衍射分析证实,所有薄膜都是多晶体,其优先取向沿钛铁矿(CuO)单斜晶体结构相的平面(-111)。扫描电镜图像显示薄膜表面均匀光滑。结晶度和晶粒尺寸都得到了改善。溶液浓度的增加导致可见光区域的透射率和反射率降低。根据透射率和反射率数据估算了能隙、吸收系数、消光系数、折射率、介电常数(ԑr 和 ԑi)和损耗能。间隙能从 2.72 eV 下降到 2.56 eV。在 0.025 mol/L 下沉积的薄膜显示出最高的介电常数实部(ԑr ~ 17)。薄膜电阻率随着摩尔浓度的增加而降低,约为 102 Ω cm。估计的介电常数表明,所制备的氧化铜薄膜可用作在可见光-近红外辐射区域工作的光电器件的介电层。此外,在 0.075 摩尔/升浓度下获得的薄膜具有相对较高的带隙、高吸收系数和高电导率,使其成为太阳能电池应用中吸收层的良好候选材料。
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来源期刊
CiteScore
3.10
自引率
7.70%
发文量
44
审稿时长
>12 weeks
期刊介绍: The main scope of the journal is to publish original research articles in the wide field of chemical engineering including environmental and bioengineering.
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