Laser direct forming submicron Cu-rich particle structural TiZrNbCux medium-entropy alloy coatings to achieve desirable anti-bacterial property

IF 1.7 4区 工程技术 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Junfeng Wang, Yaxiong Guo, Jiawang Wu, Fangping Wang, Xiaojuan Shang, Jing Zhang, Qibin Liu
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引用次数: 0

Abstract

To develop high-performance medical alloy coatings that can reduce the risk of postoperative infection, TiZrNbCux refractory medium-entropy alloy (RMEA) coatings are designed and prepared on the Ti6Al4V alloy. The effects of varying Cu additions on the microstructure, micro/nano-hardness, elastic modulus, wear resistance, corrosion resistance, and antibacterial properties are investigated. The microstructure reveals that the RMEA coatings comprise body-centered-cubic dendrites and an Mo2Si-type interdendritic (Ti, Zr)2Cu phase. Also, the contents and dimensions of (Ti, Zr)2Cu gradually increase with the increasing Cu contents. The increased amounts of Cu atoms are beneficial for the improvement of hardness and elastic modulus, but contribute little to wear resistance. Meanwhile, the electrochemical polarization curve reflects that Cu-containing RMEA coatings show superior corrosion resistance. The antibacterial test on the Cu0.1 RMEA coating demonstrates a 99.95% antibacterial rate against S. aureus after coculturing for 18 h, indicating its novel antibacterial property. Thus, TiZrNbCux RMEA coatings present huge potential in medical applications for implants.
激光直接形成亚微米富铜颗粒结构 TiZrNbCux 中熵合金涂层,实现理想的抗菌性能
为了开发可降低术后感染风险的高性能医用合金涂层,我们在 Ti6Al4V 合金上设计并制备了 TiZrNbCux 难熔中熵合金(RMEA)涂层。研究了不同铜添加量对微观结构、微/纳米硬度、弹性模量、耐磨性、耐腐蚀性和抗菌性能的影响。显微结构显示,RMEA 涂层由体心立方枝晶和 Mo2Si- 型枝晶间(Ti、Zr)2Cu 相组成。此外,随着铜含量的增加,(Ti,Zr)2Cu 的含量和尺寸也逐渐增大。Cu 原子含量的增加有利于提高硬度和弹性模量,但对耐磨性的影响很小。同时,电化学极化曲线反映出含铜的 RMEA 涂层具有优异的耐腐蚀性。对 Cu0.1 RMEA 涂层进行的抗菌测试表明,在共培养 18 小时后,其对金黄色葡萄球菌的抗菌率达到 99.95%,这表明其具有新颖的抗菌特性。因此,TiZrNbCux RMEA 涂层在植入物的医疗应用中具有巨大的潜力。
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来源期刊
CiteScore
3.60
自引率
9.50%
发文量
125
审稿时长
>12 weeks
期刊介绍: The Journal of Laser Applications (JLA) is the scientific platform of the Laser Institute of America (LIA) and is published in cooperation with AIP Publishing. The high-quality articles cover a broad range from fundamental and applied research and development to industrial applications. Therefore, JLA is a reflection of the state-of-R&D in photonic production, sensing and measurement as well as Laser safety. The following international and well known first-class scientists serve as allocated Editors in 9 new categories: High Precision Materials Processing with Ultrafast Lasers Laser Additive Manufacturing High Power Materials Processing with High Brightness Lasers Emerging Applications of Laser Technologies in High-performance/Multi-function Materials and Structures Surface Modification Lasers in Nanomanufacturing / Nanophotonics & Thin Film Technology Spectroscopy / Imaging / Diagnostics / Measurements Laser Systems and Markets Medical Applications & Safety Thermal Transportation Nanomaterials and Nanoprocessing Laser applications in Microelectronics.
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