{"title":"PerfectTailor: Scale-Preserving 2-D Pattern Adjustment Driven by 3-D Garment Editing.","authors":"Anran Qi, Takeo Igarashi","doi":"10.1109/MCG.2024.3378171","DOIUrl":null,"url":null,"abstract":"<p><p>We address the problem of modifying a given well-designed 2-D sewing pattern to accommodate garment edits in the 3-D space. Existing methods usually adjust the sewing pattern by applying uniform flattening to the 3-D garment. The problems are twofold: first, it ignores local scaling of the 2-D sewing pattern such as shrinking ribs of cuffs; second, it does not respect the implicit design rules and conventions of the industry, such as the use of straight edges for simplicity and precision in sewing. To address those problems, we present a pattern adjustment method that considers the nonuniform local scaling of the 2-D sewing pattern by utilizing the intrinsic scale matrix. In addition, we preserve the original boundary shape by an as-original-as-possible geometric constraint when desirable. We build a prototype with a set of commonly used alteration operations and showcase the capability of our method via a number of alteration examples throughout the article.</p>","PeriodicalId":55026,"journal":{"name":"IEEE Computer Graphics and Applications","volume":"PP ","pages":"126-132"},"PeriodicalIF":1.7000,"publicationDate":"2024-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Computer Graphics and Applications","FirstCategoryId":"94","ListUrlMain":"https://doi.org/10.1109/MCG.2024.3378171","RegionNum":4,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/8/20 0:00:00","PubModel":"Epub","JCR":"Q3","JCRName":"COMPUTER SCIENCE, SOFTWARE ENGINEERING","Score":null,"Total":0}
引用次数: 0
Abstract
We address the problem of modifying a given well-designed 2-D sewing pattern to accommodate garment edits in the 3-D space. Existing methods usually adjust the sewing pattern by applying uniform flattening to the 3-D garment. The problems are twofold: first, it ignores local scaling of the 2-D sewing pattern such as shrinking ribs of cuffs; second, it does not respect the implicit design rules and conventions of the industry, such as the use of straight edges for simplicity and precision in sewing. To address those problems, we present a pattern adjustment method that considers the nonuniform local scaling of the 2-D sewing pattern by utilizing the intrinsic scale matrix. In addition, we preserve the original boundary shape by an as-original-as-possible geometric constraint when desirable. We build a prototype with a set of commonly used alteration operations and showcase the capability of our method via a number of alteration examples throughout the article.
期刊介绍:
IEEE Computer Graphics and Applications (CG&A) bridges the theory and practice of computer graphics, visualization, virtual and augmented reality, and HCI. From specific algorithms to full system implementations, CG&A offers a unique combination of peer-reviewed feature articles and informal departments. Theme issues guest edited by leading researchers in their fields track the latest developments and trends in computer-generated graphical content, while tutorials and surveys provide a broad overview of interesting and timely topics. Regular departments further explore the core areas of graphics as well as extend into topics such as usability, education, history, and opinion. Each issue, the story of our cover focuses on creative applications of the technology by an artist or designer. Published six times a year, CG&A is indispensable reading for people working at the leading edge of computer-generated graphics technology and its applications in everything from business to the arts.