Fabrication of fluidic submicron-channels by pulsed laser-induced buckling of SiOx films on fused silica.

0 MATERIALS SCIENCE, MULTIDISCIPLINARY
Nastaran Bakhtiari, Jürgen Ihlemann
{"title":"Fabrication of fluidic submicron-channels by pulsed laser-induced buckling of SiO<sub>x</sub> films on fused silica.","authors":"Nastaran Bakhtiari, Jürgen Ihlemann","doi":"10.1186/s11671-024-03987-w","DOIUrl":null,"url":null,"abstract":"<p><p>Recently, considerable attention has been drawn to the field of micro/nanofluidic channels. However, current methods for fabricating micro/nanochannels are complex, costly, and time-intensive. In the present work, we successfully fabricated transparent submicron-channels on fused silica substrates (SiO<sub>2</sub>) using a straightforward laser process. To achieve this, a single-pulse excimer laser irradiation in a rear side configuration was employed to treat a thin film of UV-absorbing silicon suboxide (SiO<sub>x</sub>) through the transparent SiO<sub>2</sub> substrate. A polydimethylsiloxane (PDMS) superstrate (coating layer) was applied over the SiO<sub>x</sub> film before laser exposure, serving as a confinement for controlled structure formation induced by the laser. Under optimal laser fluence, the thin SiO<sub>x</sub> film buckled, leading to the formation of channels with a width ranging from 10 to 20 µm and a height of 800 to 1200 nm, exhibiting a bell-like cross-sections following the so-called Euler buckling mode. Wider channels displayed morphologies resembling varicose or telephone cord modes. Subsequent high-temperature annealing led to the oxidation of SiO<sub>x</sub>, resulting transparent SiO<sub>2</sub> channels on the fused silica substrate. The manufactured nanochannels exhibited promising potential for effectively transporting fluids of diverse viscosities. Various fluids were conveyed through these nanochannels via capillary action and in accordance with the Lucas-Washburn equation.</p>","PeriodicalId":72828,"journal":{"name":"Discover nano","volume":"19 1","pages":"46"},"PeriodicalIF":0.0000,"publicationDate":"2024-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10940550/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Discover nano","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1186/s11671-024-03987-w","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"0","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Recently, considerable attention has been drawn to the field of micro/nanofluidic channels. However, current methods for fabricating micro/nanochannels are complex, costly, and time-intensive. In the present work, we successfully fabricated transparent submicron-channels on fused silica substrates (SiO2) using a straightforward laser process. To achieve this, a single-pulse excimer laser irradiation in a rear side configuration was employed to treat a thin film of UV-absorbing silicon suboxide (SiOx) through the transparent SiO2 substrate. A polydimethylsiloxane (PDMS) superstrate (coating layer) was applied over the SiOx film before laser exposure, serving as a confinement for controlled structure formation induced by the laser. Under optimal laser fluence, the thin SiOx film buckled, leading to the formation of channels with a width ranging from 10 to 20 µm and a height of 800 to 1200 nm, exhibiting a bell-like cross-sections following the so-called Euler buckling mode. Wider channels displayed morphologies resembling varicose or telephone cord modes. Subsequent high-temperature annealing led to the oxidation of SiOx, resulting transparent SiO2 channels on the fused silica substrate. The manufactured nanochannels exhibited promising potential for effectively transporting fluids of diverse viscosities. Various fluids were conveyed through these nanochannels via capillary action and in accordance with the Lucas-Washburn equation.

Abstract Image

通过脉冲激光诱导熔融石英上的氧化硅薄膜降压,制造流体亚微米通道。
最近,微/纳米流体通道领域引起了广泛关注。然而,目前制造微米/纳米通道的方法复杂、成本高、耗时长。在本研究中,我们采用一种简单的激光工艺,成功地在熔融石英基底(二氧化硅)上制造出了透明的亚微米通道。为了实现这一目标,我们采用了单脉冲准分子激光器的后侧照射方式,通过透明的二氧化硅基底处理紫外线吸收硅亚氧化物(SiOx)薄膜。在激光照射之前,在氧化硅薄膜上涂覆了一层聚二甲基硅氧烷(PDMS)基板(涂层),作为激光诱导的可控结构形成的限制层。在最佳激光通量下,氧化硅薄膜发生屈曲,形成宽度为 10 至 20 µm、高度为 800 至 1200 nm 的通道,按照所谓的欧拉屈曲模式呈现出钟形截面。更宽的通道显示出类似于曲张或电话线模式的形态。随后的高温退火导致氧化硅氧化,从而在熔融石英基底上形成透明的二氧化硅通道。制造出的纳米通道在有效输送不同粘度的流体方面表现出了巨大的潜力。根据卢卡斯-沃什伯恩方程,各种流体通过毛细作用被输送到这些纳米通道中。
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CiteScore
0.70
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