Thermodynamic Modeling of the CVD Process in the Ni–Si–C–H System

IF 1.8 3区化学 Q3 CHEMISTRY, INORGANIC & NUCLEAR

Russian Journal of Inorganic Chemistry Pub Date : 2024-03-11 DOI:10.1134/s0036023623602441

V. A. Shestakov, M. L. Kosinova

引用次数: 0

Abstract

Oxygen-free ceramics are promising for use in various technologies owing to their unique properties. Additions of metals or metal compounds significantly expand the application range of the ceramics. Therefore, methods for the synthesis of such composites are being actively developed. One way to manufacture such films is chemical vapor deposition (CVD). Thermodynamic modeling offers a means to choose the process parameters. In this work, thermodynamic modeling of the CVD process in the Ni–Si–C–H system, where nickelocene and silane were precursors, was carried out. The results can be useful for film materials design based on SiC and nickel-containing phases.

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镍-硅-碳-氢体系中 CVD 过程的热力学建模

摘要无氧陶瓷因其独特的性能而有望用于各种技术。金属或金属化合物的添加大大扩展了陶瓷的应用范围。因此，人们正在积极开发合成这种复合材料的方法。化学气相沉积（CVD）是制造此类薄膜的一种方法。热力学建模为选择工艺参数提供了一种方法。在这项工作中，对以二茂镍和硅烷为前驱体的 Ni-Si-C-H 系统中的 CVD 过程进行了热力学建模。研究结果有助于基于碳化硅和含镍相的薄膜材料设计。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Russian Journal of Inorganic Chemistry 化学-无机化学与核化学

CiteScore

3.10

自引率

38.10%

发文量

237

审稿时长

3 months

期刊介绍： Russian Journal of Inorganic Chemistry is a monthly periodical that covers the following topics of research: the synthesis and properties of inorganic compounds, coordination compounds, physicochemical analysis of inorganic systems, theoretical inorganic chemistry, physical methods of investigation, chemistry of solutions, inorganic materials, and nanomaterials.