Ion acceleration from golden mylar film irradiated by visible ns pulsed laser

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
L. Torrisi, L. Silipigni, M. Cutroneo, A. Torrisi
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引用次数: 0

Abstract

A Pulsed ns laser operating at 532 nm wavelength with 150 mJ pulse energy was employed to irradiate micrometric thick mylar films, from 1 to 100 μm thick, covered by 0.05 μm Au in the back face. Protons and light ions have been accelerated by the electric field developed in the non‐equilibrium plasma by the laser pulse in a vacuum at an intensity of the order of 1010 W/cm2. Time‐of‐flight technique, obtained using a Faraday cup and a fast storage oscilloscope, is employed to measure the ion velocity, energy, and yield emitted in backward and forward directions. The yield of the emitted plasma photons is also evaluated. Two ion collectors are used in opposite directions to measure the plasma radiations emitted in backward and forward directions. Data analysis is based on the Coulomb‐Boltzmann‐shifted (CBS) distribution function. The target ablation yield is evaluated in the order of 3.5 μm per laser shot.
用可见 ns 脉冲激光辐照金色麦拉薄膜时的离子加速度
利用波长为 532 nm、脉冲能量为 150 mJ 的脉冲 ns 激光器辐照厚度为 1 至 100 μm 的微米厚的聚酯薄膜,薄膜背面覆盖有 0.05 μm 的金。质子和轻离子在非平衡等离子体中被真空中强度为 1010 W/cm2 的激光脉冲产生的电场加速。利用法拉第杯和快速存储示波器获得的飞行时间技术,可以测量离子的速度、能量以及向前和向后发射的产率。此外,还对发射的等离子光子产量进行了评估。使用两个方向相反的离子收集器来测量前后方向发射的等离子辐射。数据分析基于库仑-波兹曼偏移(CBS)分布函数。每次激光发射的目标烧蚀率约为 3.5 μm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Contributions to Plasma Physics
Contributions to Plasma Physics 物理-物理:流体与等离子体
CiteScore
2.90
自引率
12.50%
发文量
110
审稿时长
4-8 weeks
期刊介绍: Aims and Scope of Contributions to Plasma Physics: Basic physics of low-temperature plasmas; Strongly correlated non-ideal plasmas; Dusty Plasmas; Plasma discharges - microplasmas, reactive, and atmospheric pressure plasmas; Plasma diagnostics; Plasma-surface interaction; Plasma technology; Plasma medicine.
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