Higher Order Mode Elimination for SAW Resonators Based on LiNbO₃/SiO₂/poly-Si/Si Substrate by Si Orientation Optimization

IF 2.5 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Huiping Xu;Sulei Fu;Rongxuan Su;Peisen Liu;Boyuan Xiao;Shuai Zhang;Rui Wang;Cheng Song;Fei Zeng;Weibiao Wang;Feng Pan
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Abstract

Lithium-niobate-on-insulator (LNOI) platform has emerged as a promising solution for fabricating wideband and low-loss surface acoustic wave (SAW) filters. However, it simultaneously excites higher order modes, causing out-of-band (OoB) spurious responses. In this work, the elimination condition for higher order modes in LiNbO3 (LN)/SiO2/poly-Si/Si structure was summarized from analyzing the coupling mechanism between the velocities of shear bulk acoustic waves ( $V_{\mathrm {S}}$ ) of Si and that of higher order mode ( $V_{\mathrm {p-h}}$ ). According to the elimination condition of $V_{\mathrm {p-h}}$ exceeding $V_{\mathrm {S}}$ , meticulously selecting the crystal plane and propagation angle $\alpha $ of Si to obtain desired $V_{\mathrm {S}}$ is necessary. First, the resonators built on $32^{\circ }Y$ - $X$ LN/SiO2/poly-Si/Si platforms with typical Si (100), Si (110) and Si (111) substrates were studied by simulation, which reveals that Si (110) manifests the optimal suppression capacity with $\alpha _{110}$ window of $18^{\circ }-60^{\circ }$ , followed by the Si (111) plane of $\alpha _{111}= 14^{\circ }-36^{\circ }$ . Si (100) substrate can hardly suppress higher order modes. Furthermore, resonators were designed and prepared on the above three Si planes. In coherence with the theoretical prediction, the resonators built on Si (135°, 90°, 45°) substrate can effectively eliminate the OoB ripples, while the resonators based on Si (0°, 0°, 45°) and Si (135°, 54.74°, 60°) substrates both excite the higher order modes, whose maximum admittance ratios (AR $_{\mathrm {h}}$ ) are 15.0 dB and 19.9 dB, respectively. This work demonstrates a valid methodology for constructing spurious-free filters meeting 5G requirements. [2023-0212]
通过硅取向优化消除基于 LiNbO$_{3}$/SiO$_{2}$/poly-Si/Si 衬底的声表面波谐振器的高阶模式
绝缘体上的铌酸锂(LNOI)平台已成为制造宽带、低损耗表面声波(SAW)滤波器的理想解决方案。然而,它同时会激发高阶模式,导致带外(OoB)杂散响应。在这项研究中,通过分析硅的剪切体声波速度($V_{\mathrm {S}}$ )与高阶模式速度($V_{\mathrm {p-h}}$ )之间的耦合机制,总结出了铌酸锂(LN)/二氧化硅(SiO2)/聚硅/硅结构中高阶模式的消除条件。根据$V_{m\mathrm {p-h}}$ 超过$V_{m\mathrm {S}}$的消除条件,必须精心选择硅的晶面和传播角$α$,以获得所需的$V_{m\mathrm {S}}$。首先,通过仿真研究了建立在 32^{\circ }Y$ - $X$ LN/SiO2/ 聚硅/硅平台上的谐振器,其基底分别为典型的 Si (100)、Si (110) 和 Si (111)、结果表明,Si (110) 的最佳抑制能力为 $18^{\circ }-60^{\circ }$,其次是 Si (111) 平面的 $\alpha _{111}= 14^{\circ }-36^{\circ }$。硅(100)基板很难抑制高阶模式。此外,我们还在上述三个硅平面上设计并制备了谐振器。与理论预测一致,基于硅(135°, 90°, 45°)基板的谐振器能有效消除 OoB 波纹,而基于硅(0°, 0°, 45°)和硅(135°, 54.74°, 60°)基板的谐振器都能激发高阶模,其最大导纳比(AR $_{\mathrm {h}}$ )分别为 15.0 dB 和 19.9 dB。这项工作展示了构建符合 5G 要求的无杂散滤波器的有效方法。[2023-0212]
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来源期刊
Journal of Microelectromechanical Systems
Journal of Microelectromechanical Systems 工程技术-工程:电子与电气
CiteScore
6.20
自引率
7.40%
发文量
115
审稿时长
7.5 months
期刊介绍: The topics of interest include, but are not limited to: devices ranging in size from microns to millimeters, IC-compatible fabrication techniques, other fabrication techniques, measurement of micro phenomena, theoretical results, new materials and designs, micro actuators, micro robots, micro batteries, bearings, wear, reliability, electrical interconnections, micro telemanipulation, and standards appropriate to MEMS. Application examples and application oriented devices in fluidics, optics, bio-medical engineering, etc., are also of central interest.
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