Manufacturing Technology of OLED Structures. Control of Basic Parameters

Abstract

The article represents a translated, revised, and updated excerpt from the book Electroluminescent Organic Light-Emitting Diodes Based on Metal Coordination Compounds, Rostov-on-Don: Yuzhn. Fed. Univ., 2015; ISBN 978-5-9275-1469-4 (see Additional Information). The main technological stages for manufacturing of laboratory samples for electroluminescence are described in general terms. The most popular laboratory techniques for the formation of thin semiconducting organic films, such as solution spin coating and vacuum thermal deposition, are considered in more detail. Some methodological approaches used in our laboratory are outlined. Measurements of the polymer layer thickness by the interference method and by atomic force microscopy are considered in detail. For the interference method, the principal sources of systematic errors are examined. Concerning atomic force microscopy (AFM), two techniques for measuring thickness are considered: the express technique (macro-needle scratching) and scratching with an AFM probe in contact mode. Systematic errors associated with the first technique are determined, followed by recommendations regarding its potential application. The last section highlights the necessary adjustment for calibrating thickness sensors during film deposition if the calibration is conducted based on macro-needle scratching results.