{"title":"Improving electrochromic properties of V2O5 smart film through Ti incorporation: Local atomic and electronic perspectives","authors":"I-Han Wu , Arvind Chandrasekar , Kumaravelu Thanigai Arul , Yu-Cheng Huang , Ta Thi Thuy Nga , Chi-Liang Chen , Jeng-Lung Chen , Da-Hua Wei , Kandasami Asokan , Ping-Hung Yeh , Chao-Hung Du , Wu-Ching Chou , Chung-Li Dong","doi":"10.1016/j.omx.2024.100301","DOIUrl":null,"url":null,"abstract":"<div><p>In this work, vanadium pentoxide (V<sub>2</sub>O<sub>5</sub>) and titanium-modified V<sub>2</sub>O<sub>5</sub> thin films were synthesized using the sol-gel spin coating route. The effect of Ti-doping concentration on the electrochromic optical properties and atomic/electronic structures of V<sub>2</sub>O<sub>5</sub> smart thin films is examined. As the doping concentration of Ti increases, the surface roughness of the films is reduced. The structure of the films is analyzed using X-ray diffraction (XRD) and Raman spectroscopy, while the electrochromic modulation of atomic and electronic structures is elucidated through Raman and X-ray absorption spectroscopy (XAS) conducted during lithiation and delithiation. The XRD patterns demonstrate that an increase in Ti concentration leads to a more amorphous structure of the films and a shift of the main diffraction peak to a lower angle, attributable to the enlarged spacing between the stacking layers resulting from the incorporation of Ti ions. Soft X-ray absorption spectroscopy (XAS) and in situ hard XAS of the V L-edge, the O K-edge, and the V K-edge revealed a reduction in the charge state of V and local atomic structural symmetry modification upon lithated coloration and delithiated bleaching process. The critical insights provided by in situ XAS provides reveal that a small amount of Ti has the ability to modify the interlayer distance and local atomic structure of V<sub>2</sub>O<sub>5</sub>, thereby improving its electrochromic switching rate and stability when utilized in smart windows.</p></div>","PeriodicalId":52192,"journal":{"name":"Optical Materials: X","volume":"22 ","pages":"Article 100301"},"PeriodicalIF":0.0000,"publicationDate":"2024-02-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2590147824000135/pdfft?md5=5abefa0dd711be0cab990f3688304dd3&pid=1-s2.0-S2590147824000135-main.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Materials: X","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2590147824000135","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 0
Abstract
In this work, vanadium pentoxide (V2O5) and titanium-modified V2O5 thin films were synthesized using the sol-gel spin coating route. The effect of Ti-doping concentration on the electrochromic optical properties and atomic/electronic structures of V2O5 smart thin films is examined. As the doping concentration of Ti increases, the surface roughness of the films is reduced. The structure of the films is analyzed using X-ray diffraction (XRD) and Raman spectroscopy, while the electrochromic modulation of atomic and electronic structures is elucidated through Raman and X-ray absorption spectroscopy (XAS) conducted during lithiation and delithiation. The XRD patterns demonstrate that an increase in Ti concentration leads to a more amorphous structure of the films and a shift of the main diffraction peak to a lower angle, attributable to the enlarged spacing between the stacking layers resulting from the incorporation of Ti ions. Soft X-ray absorption spectroscopy (XAS) and in situ hard XAS of the V L-edge, the O K-edge, and the V K-edge revealed a reduction in the charge state of V and local atomic structural symmetry modification upon lithated coloration and delithiated bleaching process. The critical insights provided by in situ XAS provides reveal that a small amount of Ti has the ability to modify the interlayer distance and local atomic structure of V2O5, thereby improving its electrochromic switching rate and stability when utilized in smart windows.
本研究采用溶胶-凝胶旋涂路线合成了五氧化二钒(V2O5)和钛改性 V2O5 薄膜。研究了钛掺杂浓度对 V2O5 智能薄膜的电致变色光学特性和原子/电子结构的影响。随着钛掺杂浓度的增加,薄膜的表面粗糙度降低。利用 X 射线衍射 (XRD) 和拉曼光谱分析了薄膜的结构,并通过拉曼和 X 射线吸收光谱 (XAS) 阐明了在石化和脱石化过程中原子和电子结构的电致变色调制。X 射线衍射图显示,钛浓度的增加导致薄膜的非晶态结构增加,主衍射峰向低角度移动,这是因为钛离子的加入扩大了堆积层之间的间距。对 V L-边、O K-边和 V K-边进行的软 X 射线吸收光谱(XAS)和原位硬 XAS 分析表明,在石化着色和脱石漂白过程中,V 的电荷状态降低,局部原子结构对称性发生了改变。原位 XAS 提供的重要启示揭示了少量的 Ti 能够改变 V2O5 的层间距离和局部原子结构,从而提高其在智能窗户中的电致变色切换率和稳定性。