{"title":"Perpendicular Domain Orientation of Poly(styrene-block-methylmethacrylate (PS-b-PMMA) Thin Films Produced on Zinc Oxide Nanoparticle Layer","authors":"A. Talla, Z. N. Urgessa, J. R. Botha","doi":"10.1134/S0965545X23600291","DOIUrl":null,"url":null,"abstract":"<p>Perpendicular di-block copolymer domains are produced when poly(styrene-<i>block</i>-methylmethacrylate (PS-<i>b</i>-PMMA) is spun onto a disordered layer of zinc oxide nanoparticles, followed by thermal annealing in vacuum. The ZnO layer creates a rough surface on the silicon substrate, inducing vertical cylinders of PMMA. The subsequent development of a PS template is illustrated. The wet etching process removed the vertically oriented PMMA nanodomains in the PS matrix. The morphology of the PS mask showed ordered nanopores with diameters around 20 nm. The effect of surface roughness and di-block film thickness on forming perpendicular cylindrical domains of PS-<i>b</i>-PMMA is analyzed. For a typical thickness of PS-<i>b</i>-PMMA film around 33 nm, a specific surface roughness parameter of 0.07 is obtained. These results are compared with other reports on this topic.</p>","PeriodicalId":738,"journal":{"name":"Polymer Science, Series A","volume":"65 6","pages":"655 - 665"},"PeriodicalIF":1.0000,"publicationDate":"2024-02-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Polymer Science, Series A","FirstCategoryId":"1","ListUrlMain":"https://link.springer.com/article/10.1134/S0965545X23600291","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}
引用次数: 0
Abstract
Perpendicular di-block copolymer domains are produced when poly(styrene-block-methylmethacrylate (PS-b-PMMA) is spun onto a disordered layer of zinc oxide nanoparticles, followed by thermal annealing in vacuum. The ZnO layer creates a rough surface on the silicon substrate, inducing vertical cylinders of PMMA. The subsequent development of a PS template is illustrated. The wet etching process removed the vertically oriented PMMA nanodomains in the PS matrix. The morphology of the PS mask showed ordered nanopores with diameters around 20 nm. The effect of surface roughness and di-block film thickness on forming perpendicular cylindrical domains of PS-b-PMMA is analyzed. For a typical thickness of PS-b-PMMA film around 33 nm, a specific surface roughness parameter of 0.07 is obtained. These results are compared with other reports on this topic.
期刊介绍：
Polymer Science, Series A is a journal published in collaboration with the Russian Academy of Sciences. Series A includes experimental and theoretical papers and reviews devoted to physicochemical studies of the structure and properties of polymers (6 issues a year). All journal series present original papers and reviews covering all fundamental aspects of macromolecular science. Contributions should be of marked novelty and interest for a broad readership. Articles may be written in English or Russian regardless of country and nationality of authors. All manuscripts are peer reviewed. Online submission via Internet to the Series A, B, and C is available at http://polymsci.ru.
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