Hybrid simulation of instabilities in capacitively coupled RF CF4/Ar plasmas driven by a dual frequency source

Wan Dong, Yifan Zhang, Julian Schulze, Yuan-Hong Song
{"title":"Hybrid simulation of instabilities in capacitively coupled RF CF4/Ar plasmas driven by a dual frequency source","authors":"Wan Dong, Yifan Zhang, Julian Schulze, Yuan-Hong Song","doi":"10.1088/1361-6595/ad270e","DOIUrl":null,"url":null,"abstract":"\n Instabilities in capacitively coupled Ar/CF4 plasma discharges driven by dual frequency sources are investigated using a one-dimensional fluid/electron Monte Carlo (MC) hybrid model. Periodic oscillations of the electron density and temperature on the timescale of multiple low frequency periods are observed. As the electron density increases, an intense oscillation of the electron temperature within each high frequency period is initiated. This causes a fluctuation of the electron density and results in a discharge instability. This phenomenon is consistent with the discharge behavior observed in scenarios with single-frequency (SF) sources, as reported by Dong et al. [PSST 31 (2022) 025006]. However, unlike the single-frequency case, plasma parameters such as the electron density, electric field, electron power absorption and ionization rate exhibit not only periodic fluctuations but also a spatial asymmetry under the influence of the dual-frequency source. This spatial asymmetry leads to a non-uniform distribution of the electron density between the electrodes, which is related to a spatially asymmetric electric field, electron heating, and ionization around a region of minimum electron density (inside the bulk). This region of minimum electron density is shifted back and forth through the entire plasma bulk from one electrode to the other within multiple low frequency period. The above phenomena are related to superposition effect between the instabilities and the dual-frequency source. Moreover, the time averaged electric field influences the spatio-temporal evolution of ion fluxes. The ion fluxes at the electrodes, which play an important role in etching processes, are affected by both the high and low frequency components of the driving voltage waveform as well as the observed instabilities. As the high frequency increases, the electronegativity and electron temperature are reduced and the electron density increases, resulting in a gradual disappearance of the instabilities.","PeriodicalId":508056,"journal":{"name":"Plasma Sources Science and Technology","volume":"68 3","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-02-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Sources Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6595/ad270e","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Instabilities in capacitively coupled Ar/CF4 plasma discharges driven by dual frequency sources are investigated using a one-dimensional fluid/electron Monte Carlo (MC) hybrid model. Periodic oscillations of the electron density and temperature on the timescale of multiple low frequency periods are observed. As the electron density increases, an intense oscillation of the electron temperature within each high frequency period is initiated. This causes a fluctuation of the electron density and results in a discharge instability. This phenomenon is consistent with the discharge behavior observed in scenarios with single-frequency (SF) sources, as reported by Dong et al. [PSST 31 (2022) 025006]. However, unlike the single-frequency case, plasma parameters such as the electron density, electric field, electron power absorption and ionization rate exhibit not only periodic fluctuations but also a spatial asymmetry under the influence of the dual-frequency source. This spatial asymmetry leads to a non-uniform distribution of the electron density between the electrodes, which is related to a spatially asymmetric electric field, electron heating, and ionization around a region of minimum electron density (inside the bulk). This region of minimum electron density is shifted back and forth through the entire plasma bulk from one electrode to the other within multiple low frequency period. The above phenomena are related to superposition effect between the instabilities and the dual-frequency source. Moreover, the time averaged electric field influences the spatio-temporal evolution of ion fluxes. The ion fluxes at the electrodes, which play an important role in etching processes, are affected by both the high and low frequency components of the driving voltage waveform as well as the observed instabilities. As the high frequency increases, the electronegativity and electron temperature are reduced and the electron density increases, resulting in a gradual disappearance of the instabilities.
双频源驱动的电容耦合射频 CF4/Ar 等离子体不稳定性的混合模拟
使用一维流体/电子蒙特卡洛(MC)混合模型研究了双频源驱动的电容耦合氩/四氟化碳等离子体放电中的不稳定性。在多个低频周期的时间尺度上观察到了电子密度和温度的周期性振荡。随着电子密度的增加,电子温度在每个高频周期内开始剧烈振荡。这引起了电子密度的波动,导致放电不稳定。这一现象与 Dong 等人[PSST 31 (2022) 025006]报告的在单频(SF)源情况下观察到的放电行为一致。然而,与单频情况不同的是,在双频源的影响下,电子密度、电场、电子吸收功率和电离率等等离子体参数不仅表现出周期性波动,还表现出空间不对称性。这种空间不对称性导致电极之间的电子密度分布不均匀,这与最小电子密度区域(体积内部)周围的空间不对称电场、电子加热和电离有关。在多个低频周期内,电子密度最小区域在整个等离子体体中从一个电极到另一个电极来回移动。上述现象与不稳定性和双频源之间的叠加效应有关。此外,时间平均电场也会影响离子通量的时空演变。在蚀刻过程中起重要作用的电极离子通量受到驱动电压波形的高频和低频分量以及观测到的不稳定性的影响。随着高频率的增加,电负性和电子温度降低,电子密度增加,不稳定性逐渐消失。
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