Modification of graphene oxide and its effect on properties of natural rubber/graphene oxide nanocomposites.

IF 2.6 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Beilstein Journal of Nanotechnology Pub Date : 2024-02-05 eCollection Date: 2024-01-01 DOI:10.3762/bjnano.15.16

Nghiem Thi Thuong, Le Dinh Quang, Vu Quoc Cuong, Cao Hong Ha, Nguyen Ba Lam, Seiichi Kawahara

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Abstract

Modification of graphene oxide (GO) by vinyltriethoxysilane (VTES) was investigated to study the effect of silanized GO on radical graft copolymerization of GO onto deproteinized natural rubber (DPNR). The modified GO, GO-VTES (a and b), was characterized by X-ray diffraction (XRD), Fourier-transform infrared spectroscopy, contact angle, thermal gravimetric analysis, and scanning electron microscopy. The XRD results showed the appearance of an amorphous region of silica particles at a diffraction angle of 22°. The formation of silica was investigated by ²⁹Si NMR, and it was found that the hydrolysis and condensation of VTES proceed more completely in basic conditions than in acidic conditions. The silica content of GO-VTES(b) was 43%, which is higher than that of GO-VTES(a) (8%). Morphology of silica was observed by SEM. The DPNR/GO-VTES nanocomposites prepared with the same amount of GO, GO-VTES(a), and GO-VTES(b) were characterized with tensile tests and dynamic mechanical tests. The stress at break of DPNR/GO-VTES(a) and DPNR/GO-VTES(b) was 5.2 MPa and 4.3 MPa, respectively, which were lower than that of DPNR/GO. However, it exhibited higher stress at small strains and higher storage modulus than DPNR/GO.

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氧化石墨烯的改性及其对天然橡胶/氧化石墨烯纳米复合材料性能的影响。

通过乙烯基三乙氧基硅烷（VTES）对氧化石墨烯（GO）进行改性，研究了硅烷化 GO 对 GO 与脱蛋白天然橡胶（DPNR）自由基接枝共聚的影响。通过 X 射线衍射 (XRD)、傅立叶变换红外光谱、接触角、热重分析和扫描电子显微镜对改性 GO（GO-VTES（a 和 b））进行了表征。X 射线衍射结果表明，在 22°衍射角处出现了二氧化硅颗粒的无定形区。通过 29Si NMR 对二氧化硅的形成进行了研究，发现 VTES 的水解和缩合在碱性条件下比酸性条件下进行得更彻底。GO-VTES(b) 的二氧化硅含量为 43%，高于 GO-VTES(a)（8%）。二氧化硅的形态可通过扫描电镜观察到。用等量的 GO、GO-VTES(a) 和 GO-VTES(b)制备的 DPNR/GO-VTES 纳米复合材料通过拉伸试验和动态力学试验进行了表征。DPNR/GO-VTES(a) 和 DPNR/GO-VTES(b) 的断裂应力分别为 5.2 MPa 和 4.3 MPa，低于 DPNR/GO。然而，与 DPNR/GO 相比，它表现出更高的小应变应力和更高的存储模量。

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来源期刊

Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

5.70

自引率

3.20%

发文量

109

审稿时长

2 months

期刊介绍： The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.