Ming Hui Fang, Yinong Xie, Fangqi Xue, Zhilin Wu, Jun Shi, Sheng Yu Yang, Yilin Liu, Zhihuang Liu, Hsin Chi Wang, Fajun Li, Qing Huo Liu, and Jinfeng Zhu
{"title":"Optical colorimetric LiTaO3 wafers for high-precision lithography on frequency control of SAW devices","authors":"Ming Hui Fang, Yinong Xie, Fangqi Xue, Zhilin Wu, Jun Shi, Sheng Yu Yang, Yilin Liu, Zhihuang Liu, Hsin Chi Wang, Fajun Li, Qing Huo Liu, and Jinfeng Zhu","doi":"10.1364/prj.499795","DOIUrl":null,"url":null,"abstract":"Surface acoustic wave (SAW) resonators based on lithium tantalate (LT, <span><span style=\"color: inherit;\"><span><span><span><span style=\"margin-right: 0.05em;\"><span>LiTaO</span></span><span style=\"vertical-align: -0.4em;\">3</span></span></span></span></span><script type=\"math/mml\"><math display=\"inline\"><mrow><msub><mrow><mtext>LiTaO</mtext></mrow><mn>3</mn></msub></mrow></math></script></span>) wafers are crucial elements of mobile communication filters. The use of intrinsic LT wafers typically brings about low fabrication accuracy of SAW resonators due to strong UV reflection in the lithography process. This hinders their resonance frequency control seriously in industrial manufacture. LT doping and chemical reduction could be applied to decrease the UV reflection of LT wafers for high lithographic precision. However, conventional methods fail to provide a fast and nondestructive approach to identify the UV performance of standard single-side polished LT wafers for high-precision frequency control. Here, we propose a convenient on-line sensing scheme based on the colorimetry of reduced Fe-doped LT wafers and build up an automatic testing system for industrial applications. The levels of Fe doping and chemical reduction are evaluated by the lightness and color difference of LT-based wafers. The correlation between the wafer visible colorimetry and UV reflection is established to refine the lithography process and specifically manipulate the frequency performance of SAW resonators. Our study provides a powerful tool for the fabrication control of SAW resonators and will inspire more applications on sophisticated devices of mobile communication.","PeriodicalId":20048,"journal":{"name":"Photonics Research","volume":"37 1","pages":""},"PeriodicalIF":6.6000,"publicationDate":"2024-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photonics Research","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1364/prj.499795","RegionNum":1,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
Abstract
Surface acoustic wave (SAW) resonators based on lithium tantalate (LT, LiTaO3) wafers are crucial elements of mobile communication filters. The use of intrinsic LT wafers typically brings about low fabrication accuracy of SAW resonators due to strong UV reflection in the lithography process. This hinders their resonance frequency control seriously in industrial manufacture. LT doping and chemical reduction could be applied to decrease the UV reflection of LT wafers for high lithographic precision. However, conventional methods fail to provide a fast and nondestructive approach to identify the UV performance of standard single-side polished LT wafers for high-precision frequency control. Here, we propose a convenient on-line sensing scheme based on the colorimetry of reduced Fe-doped LT wafers and build up an automatic testing system for industrial applications. The levels of Fe doping and chemical reduction are evaluated by the lightness and color difference of LT-based wafers. The correlation between the wafer visible colorimetry and UV reflection is established to refine the lithography process and specifically manipulate the frequency performance of SAW resonators. Our study provides a powerful tool for the fabrication control of SAW resonators and will inspire more applications on sophisticated devices of mobile communication.
期刊介绍:
Photonics Research is a joint publishing effort of the OSA and Chinese Laser Press.It publishes fundamental and applied research progress in optics and photonics. Topics include, but are not limited to, lasers, LEDs and other light sources; fiber optics and optical communications; imaging, detectors and sensors; novel materials and engineered structures; optical data storage and displays; plasmonics; quantum optics; diffractive optics and guided optics; medical optics and biophotonics; ultraviolet and x-rays; terahertz technology.