Post Deposition Interfacial Néel Temperature Tuning in Magnetoelectric B:Cr2O3 (Adv. Phys. Res. 1/2024)

Ather Mahmood, Jamie L. Weaver, Syed Qamar Abbas Shah, Will Echtenkamp, Jeffrey W. Lynn, Peter A. Dowben, Christian Binek
{"title":"Post Deposition Interfacial Néel Temperature Tuning in Magnetoelectric B:Cr2O3 (Adv. Phys. Res. 1/2024)","authors":"Ather Mahmood,&nbsp;Jamie L. Weaver,&nbsp;Syed Qamar Abbas Shah,&nbsp;Will Echtenkamp,&nbsp;Jeffrey W. Lynn,&nbsp;Peter A. Dowben,&nbsp;Christian Binek","doi":"10.1002/apxr.202470001","DOIUrl":null,"url":null,"abstract":"<p><b>Antiferromagnetic Spintronics</b></p><p>Energy efficient and fast, non-volatile memory is the apogee of antiferromagnetic spintronics. The cover page shows a device which utilizes an antiferromagnetic, B-doped thin film of magnetoelectric Cr<sub>2</sub>O<sub>3</sub>. Voltage applied across the film controls its Néel vector and state variable. To facilitate high temperature operation, the Néel temperature, <i>T</i><sub>N</sub>, of B:Cr<sub>2</sub>O<sub>3</sub> is tuned. In article 2300061 by Ather Mahmood, Christian Binek, and colleagues, cold neutron and x-ray photoemission (XPS) data show that annealing leads to interfacial B-accumulation and <i>T</i><sub>N</sub> increase. Neutron and XPS depth profiling map the depth dependent B-concentration.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":100035,"journal":{"name":"Advanced Physics Research","volume":"3 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/apxr.202470001","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Physics Research","FirstCategoryId":"1085","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/apxr.202470001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Antiferromagnetic Spintronics

Energy efficient and fast, non-volatile memory is the apogee of antiferromagnetic spintronics. The cover page shows a device which utilizes an antiferromagnetic, B-doped thin film of magnetoelectric Cr2O3. Voltage applied across the film controls its Néel vector and state variable. To facilitate high temperature operation, the Néel temperature, TN, of B:Cr2O3 is tuned. In article 2300061 by Ather Mahmood, Christian Binek, and colleagues, cold neutron and x-ray photoemission (XPS) data show that annealing leads to interfacial B-accumulation and TN increase. Neutron and XPS depth profiling map the depth dependent B-concentration.

Abstract Image

磁电 B:Cr2O3 中的沉积后界面奈尔温度调节(Adv. Phys. Res. 1/2024)
反铁磁性自旋电子学高效、快速的非易失性存储器是反铁磁性自旋电子学的顶峰。封面显示的是一种利用反铁磁性、掺杂 B 的磁电 Cr2O3 薄膜的装置。施加在薄膜上的电压可控制其奈尔矢量和状态变量。为便于高温操作,B:Cr2O3 的奈尔温度 TN 可调。在 Ather Mahmood、Christian Binek 及其同事撰写的文章 2300061 中,冷中子和 X 射线光发射 (XPS) 数据显示,退火会导致界面 B 积累和 TN 上升。中子和 XPS 深度剖析绘制了与深度相关的硼浓度图。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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