Rachele Sciotto, I. A. Ruiz Alvarado, W. G. Schmidt
{"title":"Substrate Doping and Defect Influence on P-Rich InP(001):H Surface Properties","authors":"Rachele Sciotto, I. A. Ruiz Alvarado, W. G. Schmidt","doi":"10.3390/surfaces7010006","DOIUrl":null,"url":null,"abstract":"Density-functional theory calculations on P-rich InP(001):H surfaces are presented. Depending on temperature, pressure and substrate doping, hydrogen desorption or adsorption will occur and influence the surface electronic properties. For p-doped samples, the charge transition levels of the P dangling bond defects resulting from H desorption will lead to Fermi level pinning in the lower half of the band gap. This explains recent experimental data. For n-doped substrates, H-deficient surfaces are the ground-state structure. This will lead to Fermi level pinning below the bulk conduction band minimum. Surface defects resulting from the adsorption of additional hydrogen can be expected as well, but affect the surface electronic properties less than H desorption.","PeriodicalId":508474,"journal":{"name":"Surfaces","volume":" 30","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-01-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surfaces","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3390/surfaces7010006","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Density-functional theory calculations on P-rich InP(001):H surfaces are presented. Depending on temperature, pressure and substrate doping, hydrogen desorption or adsorption will occur and influence the surface electronic properties. For p-doped samples, the charge transition levels of the P dangling bond defects resulting from H desorption will lead to Fermi level pinning in the lower half of the band gap. This explains recent experimental data. For n-doped substrates, H-deficient surfaces are the ground-state structure. This will lead to Fermi level pinning below the bulk conduction band minimum. Surface defects resulting from the adsorption of additional hydrogen can be expected as well, but affect the surface electronic properties less than H desorption.
本文介绍了富含 P 的 InP(001):H 表面的密度泛函理论计算。根据温度、压力和衬底掺杂情况,氢会发生解吸或吸附,并影响表面电子特性。对于掺杂 p 的样品,氢解吸导致的 P 悬空键缺陷的电荷转移水平将导致费米级钉死在带隙的下半部分。这解释了最近的实验数据。对于 n 掺杂基底,缺 H 表面是基态结构。这将导致费米级钉扎在体导带最小值以下。由于吸附了额外的氢而导致的表面缺陷也是可以预期的,但对表面电子特性的影响要小于氢的解吸。