Sulfonic Resins as Catalysts for the Oxidation of Alcohols with H2O2/KBr

IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
Vicente Dorado, C. Herrerías, Jose M. Fraile
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引用次数: 0

Abstract

Sulfonic resins can replace homogeneous sulfonic acids in the oxidation of alcohols with the H2O2/KBr system. The performance of different resins was tested with methyl 9(10)-hydroxystearate, a secondary fatty alcohol. The structural features of the resin were more important than the acid strength for the catalytic performance of this reaction. The optimization of the reaction conditions allows the recovery of the resin, although regeneration is required due to the active role of KBr, and a significant loss of sulfonic groups can be detected after nine runs. In the case of primary fatty alcohols, the oxidation leads to carboxylic acids, which are esterified with the starting alcohol under the acidic conditions. For cyclic secondary alcohols, the steric hindrance around the hydroxyl group seems to be important for the efficiency of the oxidation to ketone.
磺酸树脂作为 H2O2/KBr 氧化醇的催化剂
在用 H2O2/KBr 系统氧化醇类时,磺酸树脂可取代均相磺酸。用 9(10)-羟基硬脂酸甲酯(一种仲脂肪醇)测试了不同树脂的性能。对于该反应的催化性能而言,树脂的结构特征比酸强度更为重要。虽然由于 KBr 的活性作用而需要再生,但通过优化反应条件可以回收树脂,而且在九次运行后可以检测到磺酸基团的大量损失。对于初级脂肪醇,氧化反应会产生羧酸,在酸性条件下羧酸会与起始醇发生酯化反应。对于环状仲醇,羟基周围的立体阻碍似乎对氧化成酮的效率很重要。
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来源期刊
CiteScore
7.20
自引率
4.30%
发文量
567
期刊介绍: ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric. Indexed/​Abstracted: Web of Science SCIE Scopus CAS INSPEC Portico
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