Synergistic effect of new imidazoline derivative and 2-aminopyridine as corrosion inhibitors for Q235: Experimental and theoretical study

IF 1.6 4区化学 Q4 CHEMISTRY, PHYSICAL

Surface and Interface Analysis Pub Date : 2024-01-28 DOI:10.1002/sia.7286

Pengjie Wang, Lin Fan, Yuhao Song, Kuaihai Deng, Lei Guo, Zhonghui Li, Yuanhua Lin

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Abstract

In order to reduce the investment of corrosion inhibitors, based on experimental and theoretical studies, the corrosion inhibition and mechanism of new imidazoline derivatives (SMIS) and 2-aminopyridine (AMP) were investigated carefully. The best corrosion inhibition effect was at 0.7-g/L SMIS and 0.3-g/L AMP, the corrosion inhibition efficiency of weight loss, electrochemical impedance spectroscopy, and potentiodynamic polarization (Tafel) were 90.54%, 98.56% and 97.68%, respectively. Electrochemical research shows that SMIS& belongs to cathodic corrosion inhibition. SMIS& mainly increased the film resistance and charge transfer resistance in 1-M HCl, thus playing a certain role in corrosion inhibition. X-ray photoelectron spectroscopy and energy dispersive spectrometer proved that SMIS& can be adsorbed on the surface of Q235, molecular dynamics showed that there was a certain synergy between SMIS and AMP. This study confirmed that SMIS and AMP have a good synergistic effect, improve the corrosion inhibition efficiency, reduce the synthesis cost of SMIS, and have a certain guiding significance for synergistic corrosion inhibition.

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新型咪唑啉衍生物和 2- 氨基吡啶作为 Q235 缓蚀剂的协同效应：实验和理论研究

为了减少缓蚀剂的投资，在实验和理论研究的基础上，对新型咪唑啉衍生物（SMIS）和2-氨基吡啶（AMP）的缓蚀作用和机理进行了细致的研究。0.7-g/L SMIS 和 0.3-g/L AMP 的缓蚀效果最好，失重、电化学阻抗谱和电位极化（Tafel）的缓蚀效率分别为 90.54%、98.56% 和 97.68%。电化学研究表明，SMIS& 属于阴极缓蚀剂。SMIS& 主要增加了 1-M HCl 中的膜电阻和电荷转移电阻，从而起到一定的缓蚀作用。X 射线光电子能谱和能量色散谱仪证明，SMIS&可吸附在 Q235 表面，分子动力学研究表明，SMIS 和 AMP 之间存在一定的协同作用。该研究证实了SMIS与AMP具有良好的协同效应，提高了缓蚀效率，降低了SMIS的合成成本，对协同缓蚀具有一定的指导意义。

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来源期刊

Surface and Interface Analysis 化学-物理化学

CiteScore

3.30

自引率

5.90%

发文量

130

审稿时长

4.4 months

期刊介绍： Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).