Structural, infrared optical and mechanical properties of the magnesium fluoride films

IF 3.1 3区物理与天体物理 Q2 INSTRUMENTS & INSTRUMENTATION

Infrared Physics & Technology Pub Date : 2024-01-24 DOI:10.1016/j.infrared.2024.105184

Peng Sun, Chenghui Jiang, Yugang Jiang, Dandan Liu, Lei Sun, Shijie Dun, Yu Li, Yiqin Ji, Huasong Liu

{"title":"Structural, infrared optical and mechanical properties of the magnesium fluoride films","authors":"Peng Sun, Chenghui Jiang, Yugang Jiang, Dandan Liu, Lei Sun, Shijie Dun, Yu Li, Yiqin Ji, Huasong Liu","doi":"10.1016/j.infrared.2024.105184","DOIUrl":null,"url":null,"abstract":"<div><p>In this research, the magnesium fluoride (MgF<sub>2</sub>) films are deposited by electron beam evaporation at different substrate temperatures. The structural, infrared optical properties, mechanical properties and application of the films are investigated. The films prepared at higher temperatures have better crystallinity. As indicated by SEM and AFM, large grains are formed on the film surface at higher temperatures. Preparing thin films at higher temperatures should effectively improve the microstructure with packing density, resulting in higher refractive index and lower moisture absorption. The infrared optical constants of the films are characterized by Gaussian oscillators, and the relationship between the optical absorption and the substrate temperature is revealed. The film deposited at 300 °C exhibits excellent hardness, which is above 9 GPa. The change of residual stress is mainly determined by thermal stress. By depositing MgF<sub>2</sub> films on sapphire substrates, the transmittance of the sapphire is greatly improved in the range of 3 μm–5 μm. Besides, the MgF<sub>2</sub> films are found to be excellent antireflective coatings for infrared optical elements.</p></div>","PeriodicalId":13549,"journal":{"name":"Infrared Physics & Technology","volume":"137 ","pages":"Article 105184"},"PeriodicalIF":3.1000,"publicationDate":"2024-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Infrared Physics & Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1350449524000689","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}

引用次数: 0

Abstract

In this research, the magnesium fluoride (MgF₂) films are deposited by electron beam evaporation at different substrate temperatures. The structural, infrared optical properties, mechanical properties and application of the films are investigated. The films prepared at higher temperatures have better crystallinity. As indicated by SEM and AFM, large grains are formed on the film surface at higher temperatures. Preparing thin films at higher temperatures should effectively improve the microstructure with packing density, resulting in higher refractive index and lower moisture absorption. The infrared optical constants of the films are characterized by Gaussian oscillators, and the relationship between the optical absorption and the substrate temperature is revealed. The film deposited at 300 °C exhibits excellent hardness, which is above 9 GPa. The change of residual stress is mainly determined by thermal stress. By depositing MgF₂ films on sapphire substrates, the transmittance of the sapphire is greatly improved in the range of 3 μm–5 μm. Besides, the MgF₂ films are found to be excellent antireflective coatings for infrared optical elements.

查看原文本刊更多论文

氟化镁薄膜的结构、红外光学和机械特性

本研究采用电子束蒸发法在不同基底温度下沉积氟化镁（MgF2）薄膜。研究了薄膜的结构、红外光学特性、机械特性和应用。在较高温度下制备的薄膜具有更好的结晶度。扫描电镜和原子力显微镜显示，在较高温度下，薄膜表面会形成大颗粒。在较高温度下制备薄膜可有效改善微观结构和堆积密度，从而提高折射率和降低吸湿性。利用高斯振荡器表征了薄膜的红外光学常数，并揭示了光吸收与基底温度之间的关系。在 300 °C 下沉积的薄膜硬度极佳，超过 9 GPa。残余应力的变化主要由热应力决定。通过在蓝宝石基底上沉积 MgF2 薄膜，蓝宝石的透射率在 3 μm-5 μm 范围内得到了极大的改善。此外，还发现 MgF2 薄膜是红外光学元件的优良抗反射涂层。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Infrared Physics & Technology 物理-光学

CiteScore

5.70

自引率

12.10%

发文量

400

审稿时长

67 days

期刊介绍： The Journal covers the entire field of infrared physics and technology: theory, experiment, application, devices and instrumentation. Infrared'' is defined as covering the near, mid and far infrared (terahertz) regions from 0.75um (750nm) to 1mm (300GHz.) Submissions in the 300GHz to 100GHz region may be accepted at the editors discretion if their content is relevant to shorter wavelengths. Submissions must be primarily concerned with and directly relevant to this spectral region. Its core topics can be summarized as the generation, propagation and detection, of infrared radiation; the associated optics, materials and devices; and its use in all fields of science, industry, engineering and medicine. Infrared techniques occur in many different fields, notably spectroscopy and interferometry; material characterization and processing; atmospheric physics, astronomy and space research. Scientific aspects include lasers, quantum optics, quantum electronics, image processing and semiconductor physics. Some important applications are medical diagnostics and treatment, industrial inspection and environmental monitoring.