Ion chemistry and ionic thin film deposition from HMDS-photochemistry induced by VUV-radiation from an atmospheric plasma

IF 2.9 3区物理与天体物理 Q2 PHYSICS, APPLIED

Plasma Processes and Polymers Pub Date : 2024-01-22 DOI:10.1002/ppap.202300226

Tristan Winzer, Jan Benedikt

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引用次数: 0

Abstract

Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that

{SiO}_{2} ${\text{SiO}}_{2}$

-like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. The more detailed photochemistry of HMDS-related ions is discussed based on mass spectra for different admixtures.

Abstract Image

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大气等离子体紫外线辐射诱导的 HMDS 光化学离子化学和离子薄膜沉积

向等离子体中注入前体分子通常会导致粒子在源中生成或沉积，从而影响薄膜质量和等离子体的运行。在此，我们介绍了利用远程大气等离子体的真空紫外线 (VUV) 辐射的新型装置对六甲基二硅烷 (HMDS) 的离子化学和离子薄膜沉积进行的研究。红外光谱显示，在杂质含量较高、紫外线光子到达基底的最低掺量下，可以获得类似 SiO2${text{SiO}}_{2}$ 的薄膜，而在高掺量下，只能沉积出轻微氧化的薄膜。光离子化主要形成单体离子，原因是碰撞稳定，也可能是离子质谱法发现的缓慢聚合反应。根据不同外加剂的质谱，讨论了 HMDS 相关离子更详细的光化学反应。

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来源期刊

Plasma Processes and Polymers 物理-高分子科学

CiteScore

6.60

自引率

11.40%

发文量

150

审稿时长

3 months

期刊介绍： Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.