Significant Enhancement of Perpendicular Magnetic Anisotropy in Fe/MoSi2N4 by Hole Doping

IF 3.1 3区 物理与天体物理 Q2 PHYSICS, APPLIED
F. Guo, YM Xie, Xiaoqi Huang, Feng Li, Baosheng Liu, Xinwei Dong, Jin Zhou
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引用次数: 0

Abstract

This study proposes a novel approach to enhanced the perpendicular magnetic anisotropy (PMA) of Fe adsorbed on a MoSi2N4 substrate through hole doping. First principles calculations are employed to investigate the PMA of freestanding Fe and Fe/MoSi2N4 complex system. It is found that the PMA of Fe atom slightly increases from freestanding Fe monolayer to the Fe/MoSi2N4 system, which is attributed to the overlap between Fe-3d and N-2p orbitals. More interestingly, it is found that the PMA of Fe atoms in Fe/MoSi2N4 can be further enhanced by hole doping, which enables the PMA to increase significantly, up to four times the original value. This finding provides a promising way to enhance the PMA in two-dimensional spintronic devices. These results offering potential applications in developing advanced Two-dimensional (2D) spintronic devices.
通过孔掺杂显著增强 Fe/MoSi2N4 中的垂直磁各向异性
本研究提出了一种新方法,通过掺杂空穴来增强吸附在 MoSi2N4 衬底上的铁的垂直磁各向异性(PMA)。研究采用第一性原理计算来研究独立铁和铁/MoSi2N4 复合体系的垂直磁各向异性。结果发现,从独立的 Fe 单层到 Fe/MoSi2N4 体系,Fe 原子的 PMA 都略有增加,这归因于 Fe-3d 和 N-2p 轨道之间的重叠。更有趣的是,研究发现,Fe/MoSi2N4 中铁原子的 PMA 可通过空穴掺杂进一步增强,从而使 PMA 显著增加,最高可达原始值的四倍。这一发现为增强二维自旋电子器件中的 PMA 提供了一种可行的方法。这些结果为开发先进的二维(2D)自旋电子器件提供了潜在的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics 物理-物理:应用
CiteScore
6.80
自引率
8.80%
发文量
835
审稿时长
2.1 months
期刊介绍: This journal is concerned with all aspects of applied physics research, from biophysics, magnetism, plasmas and semiconductors to the structure and properties of matter.
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