Analysis of Lanthanum Oxide Based Double-Gate SOI MOSFET using Monte-Carlo Process.

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Pattunnarajam Paramasivam, Naveenbalaji Gowthaman, Viranjay M Srivastava
{"title":"Analysis of Lanthanum Oxide Based Double-Gate SOI MOSFET using Monte-Carlo Process.","authors":"Pattunnarajam Paramasivam, Naveenbalaji Gowthaman, Viranjay M Srivastava","doi":"10.2174/0118722105273476231201073651","DOIUrl":null,"url":null,"abstract":"<p><strong>Introduction: </strong>This work proposes a Double-Gate (DG) MOSFET with a Single Material made of Silicon On-Insulator (SOI). The Lanthanum Oxide material with a high k-dielectric constant has been used as an interface between two gates and the channel. The Monte Carlo analysis has been used to determine the Conduction Band Energy (Ec) profiles and electron sheet carrier densities (ns) for a Silicon channel thickness (tsi) of 10 nm at 0.5 V gate drain-source voltages. The transverse electric fields are weak at the midchannel of DG SOI MOSFETs, where quantum effects are encountered. The Monte Carlo simulation has been confirmed to be effective for high-energy transport. A particle description reproduces the granularity property of the transport for nanoscale modeling.</p><p><strong>Methods: </strong>This work utilizes a Monte Carlo (MC) Simulation for the proposed Double Gate Single Material Silicon On Insulator MOSFET with (La2O3=2 nm) as dielectric oxide on upper and lower gate material. The electrical properties of the DG SOI MOSFETs with Lanthanum Oxide were analyzed using Monte Carlo simulation, including the conduction band energy, electric field, potential distribution, particle movement, and average velocity.</p><p><strong>Results: </strong>The peak electric field (E) simulation results and an average drift velocity (υavg) of 6Í105 V/cm and 1.6Í107 cm/s were obtained, respectively. The conduction band energy for the operating region of the source has been observed to be 4 % to the drain side, which obtained a value of -0.04 eV at the terminal end.</p><p><strong>Conclusion: </strong>This proposed patent design, such as double-gate SOI-based devices, is the best suggestion for significant scalability challenges. Emerging technologies reach the typical DG SOI MOSFET's threshold performance when their geometrical dimensions are in the nanometer region. This device based on nanomaterial compounds has been more submissive than conventional devices. The nanomaterials usage in the design is more suitable for downscaling and reducing packaging density.</p>","PeriodicalId":49324,"journal":{"name":"Recent Patents on Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.0000,"publicationDate":"2024-01-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Recent Patents on Nanotechnology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.2174/0118722105273476231201073651","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Introduction: This work proposes a Double-Gate (DG) MOSFET with a Single Material made of Silicon On-Insulator (SOI). The Lanthanum Oxide material with a high k-dielectric constant has been used as an interface between two gates and the channel. The Monte Carlo analysis has been used to determine the Conduction Band Energy (Ec) profiles and electron sheet carrier densities (ns) for a Silicon channel thickness (tsi) of 10 nm at 0.5 V gate drain-source voltages. The transverse electric fields are weak at the midchannel of DG SOI MOSFETs, where quantum effects are encountered. The Monte Carlo simulation has been confirmed to be effective for high-energy transport. A particle description reproduces the granularity property of the transport for nanoscale modeling.

Methods: This work utilizes a Monte Carlo (MC) Simulation for the proposed Double Gate Single Material Silicon On Insulator MOSFET with (La2O3=2 nm) as dielectric oxide on upper and lower gate material. The electrical properties of the DG SOI MOSFETs with Lanthanum Oxide were analyzed using Monte Carlo simulation, including the conduction band energy, electric field, potential distribution, particle movement, and average velocity.

Results: The peak electric field (E) simulation results and an average drift velocity (υavg) of 6Í105 V/cm and 1.6Í107 cm/s were obtained, respectively. The conduction band energy for the operating region of the source has been observed to be 4 % to the drain side, which obtained a value of -0.04 eV at the terminal end.

Conclusion: This proposed patent design, such as double-gate SOI-based devices, is the best suggestion for significant scalability challenges. Emerging technologies reach the typical DG SOI MOSFET's threshold performance when their geometrical dimensions are in the nanometer region. This device based on nanomaterial compounds has been more submissive than conventional devices. The nanomaterials usage in the design is more suitable for downscaling and reducing packaging density.

使用蒙特卡洛过程分析基于氧化镧的双栅极 SOI MOSFET。
简介:这项研究提出了一种采用硅绝缘体(SOI)单一材料的双栅(DG)MOSFET。具有高 k 介电常数的氧化镧材料被用作两个栅极和沟道之间的界面。在 0.5 V 栅极漏极-源极电压下,采用蒙特卡罗分析法确定了硅沟道厚度 (tsi) 为 10 nm 时的导带能量 (Ec) 曲线和电子片载流子密度 (ns)。横向电场在 DG SOI MOSFET 的中沟道处很弱,因为这里存在量子效应。蒙特卡罗模拟已被证实对高能传输有效。粒子描述再现了纳米级建模的传输粒度特性:本研究利用蒙特卡罗(Monte Carlo,MC)模拟法,对上下栅极材料以(La2O3=2 nm)作为介质氧化物的双栅极单材料绝缘体硅 MOSFET 进行了模拟。使用蒙特卡洛模拟分析了带有氧化镧的 DG SOI MOSFET 的电学特性,包括导带能量、电场、电势分布、粒子移动和平均速度:结果:得到的峰值电场(E)模拟结果和平均漂移速度(υavg)分别为 6Í105 V/cm 和 1.6Í107 cm/s。观察到源极工作区的导带能量为漏极一侧的 4%,在终端获得了-0.04 eV 的值:这项专利设计(如基于 SOI 的双栅极器件)是应对重大可扩展性挑战的最佳建议。当新兴技术的几何尺寸达到纳米级时,就能达到典型的 DG SOI MOSFET 的阈值性能。这种基于纳米材料化合物的器件比传统器件更具顺从性。在设计中使用纳米材料更适合缩小规模和降低封装密度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Recent Patents on Nanotechnology
Recent Patents on Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
4.70
自引率
10.00%
发文量
50
审稿时长
3 months
期刊介绍: Recent Patents on Nanotechnology publishes full-length/mini reviews and research articles that reflect or deal with studies in relation to a patent, application of reported patents in a study, discussion of comparison of results regarding application of a given patent, etc., and also guest edited thematic issues on recent patents in the field of nanotechnology. A selection of important and recent patents on nanotechnology is also included in the journal. The journal is essential reading for all researchers involved in nanotechnology.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信